专利检索 ap:("Seishi Fujiwara" OR "Norio Komine" OR "Hiroki Jinbo" OR "Toshitsugu Suwa") AND inv:"Toshitsugu Suwa" 第 1 页

1.

发明授权
Manufacturing method of synthetic silica glass 有权

公开(公告)号：US6094940A

公开(公告)日：2000-08-01

申请号：US265891

申请日：1999-03-11

申请人： Seishi Fujiwara , Norio Komine , Hiroki Jinbo , Toshitsugu Suwa

发明人： Seishi Fujiwara , Norio Komine , Hiroki Jinbo , Toshitsugu Suwa

IPC分类号： C03B8/04 , C03B19/14 , C03B20/00

CPC分类号： C03B19/1415 , C03B2207/32 , C03B2207/34

摘要： A method of manufacturing synthetic silica glass includes the steps of pressurizing a liquid storage tank including a liquid silicon compound therein, generating bubbles in the liquid silicon compound using a foamer, removing the bubbles using a degasser, displacing the liquid silicon compound into a vaporizer while controlling an amount of the liquid silicon compound displaced by a liquid mass flow meter, mixing the displaced liquid silicon compound with a carrier gas to generate a gaseous silicon compound, injecting the gaseous silicon compound into a synthesis furnace, and forming synthetic silica glass by hydrolyzing the gaseous silicon compound in the synthesis furnace.