公开(公告)号：US20150064621A1

公开(公告)日：2015-03-05

申请号：US14472986

申请日：2014-08-29

Applicant: Semes Co., Ltd.

Inventor： Jung Yul LEE ,  Choong Ki MIN ,  Jeong Soo KIM

IPC: G03F7/16 ,  B05B1/16 ,  B05B3/00 ,  B05C11/08 ,  B05C11/10

CPC classification number: G03F7/162 ,  H01L21/67

Abstract: Provided is a substrate treatment device. The device includes: a substrate support member supporting a substrate to be treated; a rotation driving member rotating the substrate support member; a container provided around the substrate support member; and a treatment solution supply unit including a photoresist nozzle for supplying a photoresist to a top surface of the substrate, wherein the photoresist nozzle starts supplying the photoresist while the substrate support member rotates at a first supply speed and stops supplying the photoresist while the substrate support member rotates at a second supply speed decelerated from the first supply speed.

Abstract translation: 提供了一种基板处理装置。 该装置包括：支撑待处理基板的基板支撑部件; 旋转驱动构件，旋转所述基板支撑构件; 设置在所述基板支撑构件周围的容器; 以及处理溶液供给单元，其包括用于将光致抗蚀剂供应到基板的顶表面的光致抗蚀剂喷嘴，其中，当基板支撑构件以第一供给速度旋转时，光致抗蚀剂喷嘴开始供应光致抗蚀剂，并停止供应光致抗蚀剂，同时基板支撑 构件以从第一供给速度减速的第二供给速度旋转。