公开(公告)号：US20220365275A1

公开(公告)日：2022-11-17

申请号：US17742974

申请日：2022-05-12

申请人： Semiconductor Manufacturing International (Shanghai) Corporation ,  Semiconductor Manufacturing International (Beijing) Corporation

发明人： Xiaojun CHEN ,  Honglin ZENG ,  Xia FENG ,  Dongsheng ZHANG ,  Xiage YIN ,  Jiaheng WU

IPC分类号： G02B6/12 ,  G02B6/124 ,  G02B6/13

摘要： A method of forming a semiconductor structure includes: providing an initial substrate having a first region and a second region; forming a first substrate on the initial substrate; forming a first insulating layer on the first substrate; forming a second substrate on the first insulating layer; removing the second substrate in the second region to form a second insulating layer on the first insulating layer in the second region; and forming a plurality of passive devices on the second insulating layer in the second region and forming a plurality of active devices on the second substrate in the first region.

公开(公告)号：US20230324619A1

公开(公告)日：2023-10-12

申请号：US18128501

申请日：2023-03-30

申请人： Semiconductor Manufacturing International (Shanghai) Corporation

发明人： Xiage YIN ,  Xia FENG ,  Xiaojun CHEN ,  Dongsheng ZHANG ,  Jiaheng WU

IPC分类号： G02B6/30

CPC分类号： G02B6/305

摘要： An optical device and its fabrication method are provided. The method includes: providing a substrate including a coupling region; forming a first dielectric layer on the substrate; forming an initial waveguide groove in the first dielectric layer on the coupling region; forming a patterned layer on a surface of the first dielectric layer and in the initial waveguide groove, exposing at least a portion of a bottom of the initial waveguide groove; and using the patterned layer as a mask to etch the first dielectric layer, to form a waveguide structure on the substrate. The waveguide structure includes a waveguide end structure on the coupling region.