公开(公告)号：US20020139005A1

公开(公告)日：2002-10-03

申请号：US10155402

申请日：2002-05-22

Applicant: Semitool, Inc.

Inventor： Ralph Wayne Thomas

IPC: F26B021/06

CPC classification number: H01L21/67017

Abstract: A machine for processing semiconductor wafers and similar articles has an ozone remover connected to a processing chamber. The ozone remover has a light chamber surrounded by reflectors. Ozone and other processing gases and vapors flow out of the processing chamber and into the light chamber. Ultraviolet lights in the ozone remover flood the light chamber with ultraviolet light, converting ozone into oxygen. The amount of ozone released into the environment is reduced. A recirculation line receives the gases and vapors flowing out of the ozone remover. Oxygen and any remaining ozone are separated from other gas and vapor components and are recycled back to an ozone generator, to increase the ozone generator efficiency in supplying the machine with ozone.

Abstract translation: 用于处理半导体晶片和类似物品的机器具有连接到处理室的臭氧去除器。 臭氧去除器具有被反射器包围的光室。 臭氧和其他处理气体和蒸汽从处理室流出并进入光室。 臭氧去除剂中的紫外光使紫外线泛光，将臭氧转化为氧气。 释放到环境中的臭氧的量减少。 再循环管线接收从臭氧去除剂流出的气体和蒸汽。 氧气和任何剩余的臭氧与其他气体和蒸汽组分分离，并再循环回到臭氧发生器，以增加臭氧发生器在向机器提供臭氧的效率。