公开(公告)号：US08865515B2

公开(公告)日：2014-10-21

申请号：US13356965

申请日：2012-01-24

申请人： Seok In Na ,  Dong Yu Kim ,  Hye Young Koo ,  Jin Mun Yun ,  Jun Seok Yeo ,  Jun Kyung Kim

发明人： Seok In Na ,  Dong Yu Kim ,  Hye Young Koo ,  Jin Mun Yun ,  Jun Seok Yeo ,  Jun Kyung Kim

IPC分类号： H01L51/40 ,  B82Y10/00 ,  C01B31/04 ,  B82Y40/00 ,  B82Y30/00 ,  H01L51/00 ,  H01L51/44 ,  H01L51/52 ,  H01L51/50

CPC分类号： H01L51/0045 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/192 ,  H01L51/44 ,  H01L51/442 ,  H01L51/5088 ,  H01L51/5092 ,  H01L51/5206 ,  Y02E10/549 ,  Y02P70/521

摘要： A method for fabricating a graphene thin film by reducing graphene oxide and a method for fabricating an optoelectronic device using the same are provided. The method for fabricating a graphene thin film includes preparing graphene oxide; preparing graphene through reducing the graphene oxide by a sulfonyl hydrazide-based reducing agent; preparing a graphene dispersed solution by dispersing the graphene into an organic solvent; and fabricating a graphene thin film by applying the graphene dispersed solution. The sulfonyl hydrazide-based reducing agent may be a compound having a sulfonyl hydrazide substituent of Chemical Formula 1 in the present disclosure in which A may be any one in Chemical Formula 2 in the present disclosure.

摘要翻译： 提供了通过还原石墨烯氧化物制造石墨烯薄膜的方法和使用其制造光电器件的方法。 制造石墨烯薄膜的方法包括制备氧化石墨烯; 通过磺酰肼类还原剂还原氧化石墨烯来制备石墨烯; 通过将石墨烯分散在有机溶剂中制备石墨烯分散溶液; 并通过应用石墨烯分散溶液制造石墨烯薄膜。 磺酰肼类还原剂可以是在本公开内容中具有化学式1的磺酰肼取代基的化合物，其中A可以是本公开的化学式2中的任何一个。