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公开(公告)号:US20060258725A1
公开(公告)日:2006-11-16
申请号:US10535228
申请日:2003-11-12
申请人: Sharon Boggs , Jon Collins , Stephen Hyatt , Patrick Maloney
发明人: Sharon Boggs , Jon Collins , Stephen Hyatt , Patrick Maloney
IPC分类号: A61K31/42 , C07D261/06
CPC分类号: C07D261/08 , C07D413/12 , C07D417/12
摘要: The invention relates to a compound of formula (I): wherein all variables are as defined herein and to pharmaceutical compositions, methods of using, and processes for preparing the same.
摘要翻译: 本发明涉及式(I)化合物:其中所有变量如本文所定义,以及药物组合物,使用方法及其制备方法。
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公开(公告)号:US20070269910A1
公开(公告)日:2007-11-22
申请号:US11749611
申请日:2007-05-16
申请人: Songlin Xu , Li Hou , Stephen Hyatt
发明人: Songlin Xu , Li Hou , Stephen Hyatt
IPC分类号: H01L21/66
CPC分类号: H01L22/26
摘要: An exemplary embodiment providing one or more improvements includes a wafer tilt detection apparatus for use with a wafer processing or manufacturing device that applies a process to the wafer and which utilizes an endpoint signal for determining control of the process applied to the wafer. The wafer tilt apparatus uses the endpoint signal in establishing when the wafer was in a tilted orientation during processing.
摘要翻译: 提供一个或多个改进的示例性实施例包括与晶片处理或制造装置一起使用的晶片倾斜检测装置,该晶片处理或制造装置向晶片施加过程,并且利用端点信号来确定施加到晶片的工艺的控制。 晶片倾斜装置在处理期间当晶片处于倾斜取向时,使用端点信号建立。
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公开(公告)号:US07561258B2
公开(公告)日:2009-07-14
申请号:US11749611
申请日:2007-05-16
申请人: Songlin Xu , Li Hou , Stephen Hyatt
发明人: Songlin Xu , Li Hou , Stephen Hyatt
CPC分类号: H01L22/26
摘要: An exemplary embodiment providing one or more improvements includes a wafer tilt detection apparatus for use with a wafer processing or manufacturing device that applies a process to the wafer and which utilizes an endpoint signal for determining control of the process applied to the wafer. The wafer tilt apparatus uses the endpoint signal in establishing when the wafer was in a tilted orientation during processing.
摘要翻译: 提供一个或多个改进的示例性实施例包括与晶片处理或制造装置一起使用的晶片倾斜检测装置,该晶片处理或制造装置向晶片施加过程,并且利用端点信号来确定施加到晶片的工艺的控制。 晶片倾斜装置在处理期间当晶片处于倾斜取向时,使用端点信号建立。
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