公开(公告)号：US5783359A

公开(公告)日：1998-07-21

申请号：US848521

申请日：1997-04-28

申请人： Shigeru Tomisawa ,  Yasuhiro Yoneda ,  Masahiko Sugimura

发明人： Shigeru Tomisawa ,  Yasuhiro Yoneda ,  Masahiko Sugimura

IPC分类号： G03F7/012 ,  G03F7/004 ,  H01L21/027 ,  G03C1/695

CPC分类号： G03F7/0048 ,  G03F7/012

摘要： This invention relates to a rubber photoresist composite which can be applied evenly on a large-sized or square-shaped baseboard and a method for producing a circuit board using thereof. A rubber photoresist composite of this invention comprises a photosensitive agent, a cyclized rubber and a solvent, said solvent including a solvent component having a boiling point ranging from 150.degree. C. to 220.degree. C. The rubber photoresist composite can be applied evenly on the baseboard rotated at a high speed by a spinner.

摘要翻译： 本发明涉及可以均匀地涂敷在大型或正方形基板上的橡胶光致抗蚀剂复合体及其制造方法。 本发明的橡胶光致抗蚀剂复合材料包括感光剂，环化橡胶和溶剂，所述溶剂包括沸点范围为150-220℃的溶剂组分。橡胶光致抗蚀剂复合材料可以均匀地涂在 底座用旋转器高速旋转。