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    Copolymer of vinylpyrrolidone and vinylimidazole
    2.
    发明授权
    Copolymer of vinylpyrrolidone and vinylimidazole 失效
    乙烯基吡咯烷酮和乙烯基咪唑的共聚物

    公开(公告)号：US5990269A

    公开(公告)日：1999-11-23

    申请号：US975684

    申请日：1997-11-21

    申请人： Karin Neubecker ,  Stefan Stien ,  Stephan Kothrade

    发明人： Karin Neubecker ,  Stefan Stien ,  Stephan Kothrade

    IPC分类号： C08F226/06 ,  G03F7/00 ,  G03F7/012 ,  C08G69/00 ,  C08F271/02 ,  C08F279/00

    CPC分类号： G03F7/012 ,  C08F226/06 ,  G03F7/0007

    摘要： The improved water-soluble photosensitive resin composition comprises a high-polymer compound represented by the general formula (I): ##STR1## (where X is Na, K or NH.sub.4) and a water-soluble polymer which is either polyvinylpyrrolidone or a copolymer of vinylpyrrolidone and vinylimidazole or both. The composition is applied to a substrate, exposed through a mask pattern and developed to form a photocured pattern and, thereafter, a light absorber is applied to the entire surface of the substrate and dried, followed by stripping away the photocured pattern and the overlying light absorber to form a black matrix pattern. The composition is suitable for use as a photoresist in the manufacture of black matrices as on color CRTs and capable of efficient formation of photocured patterns with high sensitivity by shorter times and lower intensities of exposure. In addition, the composition adheres strongly to glass substrates and is capable of pattern formation as thin film that is faithful to the mask pattern used. A vinylpyrrolidone/vinylimidazole copolymer is also disclosed.

    摘要翻译： 改进的水溶性光敏树脂组合物包含由通式（I）表示的高分子化合物：（其中X为Na，K或NH 4）和水溶性聚合物，其为聚乙烯吡咯烷酮或乙烯基吡咯烷酮和乙烯基咪唑的共聚物 或两者。 将组合物施加到基板上，通过掩模图案曝光并显影以形成光固化图案，然后将光吸收剂施加到基板的整个表面上并干燥，然后剥离光固化图案和上覆光 吸收体形成黑色矩阵图案。 该组合物适用于在彩色CRT上制造黑色矩阵中的光致抗蚀剂，并且能够通过更短的时间和更低的曝光强度有效地形成具有高灵敏度的光固化图案。 此外，组合物强烈地粘附到玻璃基板上，并且能够形成图案，作为忠实于所使用的掩模图案的薄膜。 还公开了乙烯基吡咯烷酮/乙烯基咪唑共聚物。

    Water-soluble photosensitive resin composition and a method of forming black matrix patterns using the same
    3.
    发明授权
    Water-soluble photosensitive resin composition and a method of forming black matrix patterns using the same 失效
    水溶性光敏树脂组合物和使用其形成黑矩阵图案的方法

    公开(公告)号：US5725978A

    公开(公告)日：1998-03-10

    申请号：US590475

    申请日：1996-01-24

    申请人： Shozo Miyazawa

    发明人： Shozo Miyazawa

    IPC分类号： C08F226/06 ,  G03F7/00 ,  G03F7/012 ,  G03C5/00

    CPC分类号： G03F7/012 ,  C08F226/06 ,  G03F7/0007

    摘要： The improved water-soluble photosensitive resin composition comprises a high-polymer compound represented by the general formula(I): ##STR1## (where X is Na, K or NH.sub.4) and a water-soluble polymer which is either polyvinylpyrrolidone or a copolymer of vinylpyrrolidone and vinylimidazole or both. The composition is applied to a substrate, exposed through a mask pattern and developed to form a photocured pattern and, thereafter, a light absorber is applied to the entire surface of the substrate and dried, followed by stripping away the photocured pattern and the overlying light absorber to form a black matrix pattern. The composition is suitable for use as a photoresist in the manufacture of black matrices as on color CRTs and capable of efficient formation of photocured patterns with high sensitivity by shorter times and lower intensities of exposure. In addition, the composition adheres strongly to glass substrates and is capable of pattern formation as thin film that is faithful to the mask pattern used.

    摘要翻译： 改进的水溶性光敏树脂组合物包含由通式（I）表示的高分子化合物：其中X是Na，K或NH 4，和水溶性聚合物，其是聚乙烯吡咯烷酮或 乙烯基吡咯烷酮和乙烯基咪唑的共聚物或两者。 将组合物施加到基板上，通过掩模图案曝光并显影以形成光固化图案，然后将光吸收剂施加到基板的整个表面上并干燥，然后剥离光固化图案和上覆光 吸收体形成黑色矩阵图案。 该组合物适用于在彩色CRT上制造黑色矩阵中的光致抗蚀剂，并且能够通过更短的时间和更低的曝光强度有效地形成具有高灵敏度的光固化图案。 此外，组合物强烈地粘附到玻璃基板上，并且能够形成图案，作为忠实于所使用的掩模图案的薄膜。

    Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing
    5.
    发明授权
    Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing 失效
    在含有重氮化合物的混合物中具有磺酰基铀侧链和含侧链的辐射敏感性聚合物

    公开(公告)号：US5254431A

    公开(公告)日：1993-10-19

    申请号：US980429

    申请日：1992-11-23

    申请人： Terence Etherington ,  Victor Kolodziejczyk

    发明人： Terence Etherington ,  Victor Kolodziejczyk

    IPC分类号： G03F7/012 ,  C08F8/00 ,  G03F7/016 ,  G03F7/021

    CPC分类号： G03F7/012 ,  Y10S430/107

    摘要： A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.

    摘要翻译： 适用于生产用于平版印刷版制造的辐射敏感板的辐射敏感材料包括具有附加的叠氮取代的芳族酯基和磺基氨基甲酸酯基的聚合物。 辐射敏感化合物通过一种方法制备，其中聚合物的一些羟基和/或环氧基团与叠氮取代的羧酸或其形成酯的衍生物反应，并且一些羟基与异氰酸磺酰酯反应。

    Water soluble photosensitive resin compositions with bisazide compound
    6.
    发明授权
    Water soluble photosensitive resin compositions with bisazide compound 失效
    具有双叠氮化合物的水溶性感光性树脂组合物

    公开(公告)号：US4842984A

    公开(公告)日：1989-06-27

    申请号：US67942

    申请日：1987-06-29

    申请人： Hajime Serizawa ,  Koichi Ojima ,  Kiyoshi Shimizu

    发明人： Hajime Serizawa ,  Koichi Ojima ,  Kiyoshi Shimizu

    IPC分类号： G03F7/038 ,  G03F7/004 ,  G03F7/008 ,  G03F7/012 ,  G03F7/031 ,  H01L21/027

    CPC分类号： G03F7/012 ,  Y10T403/33 ,  Y10T403/3946 ,  Y10T403/599

    摘要： A novel photosensitive resin composition, which has fairly high sensitivity to light and developable with water comprising of essential components a resin represented by the general formula (I), ##STR1## wherein X, which may be present or absent, represents acetic acid when present, Y stands for a group containing carbon-carbon double bond(s) represented by the formula (II), ##STR2## n is an integer of 10 or greater, more than 0 and less than 1, and t is 0 or 1, and a sodium or potassium salt of 4,4'-diazidostilbene-2,2'-disulfonic acid represented by the general formula (IV), ##STR3## wherein z stands for sodium atom or potassium atom; or the resin represented by the general formula (I), the sodium or potassium salt of 4,4'-diazidostilbene-2,2'-disulfonic acid represented by the general formula (IV), and an aromatic ketone represented by the general formula (V), ##STR4## wherein G stands for hydrogen atom or an amino group or dialkylamino group represented by the general formula (VI), ##STR5## where u is 0, 1 or 2.

    Negative-working photosensitive composition comprising a diphenylamine-melamine condensate and an azide compound
    7.
    发明授权
    Negative-working photosensitive composition comprising a diphenylamine-melamine condensate and an azide compound 失效
    包含二苯胺 - 三聚氰胺缩合物和叠氮化合物的负性感光组合物

    公开(公告)号：US4737438A

    公开(公告)日：1988-04-12

    申请号：US921790

    申请日：1986-10-21

    申请人： Naoki Ito ,  Koichiro Hashimoto ,  Wataru Ishii ,  Hisashi Nakane

    发明人： Naoki Ito ,  Koichiro Hashimoto ,  Wataru Ishii ,  Hisashi Nakane

    IPC分类号： G03F7/012 ,  G03F7/038 ,  H01L21/027 ,  G03C1/52

    CPC分类号： G03F7/012

    摘要： The negative-working photosensitive composition of the invention, which is suitable as a photoresist material in the photolithographic processing of semiconductor devices, comprises (a) a condensation product of a hydroxy-substituted diphenylamine compound such as 4-hydroxy diphenylamine and a methylol melamine or alkoxylated methylol melamine by the reaction in a medium of phosphoric or sulfuric acid and (b) an azide compound capable of strongly absorbing UV or far UV light. The composition gives a photoresist layer having high resistance against heat in the post-baking and the attack of gas plasma encountered in the dry etching for semiconductor processing.

    摘要翻译： 在半导体器件的光刻处理中适合作为光致抗蚀剂材料的本发明的负作用光敏组合物包含（a）羟基取代的二苯胺化合物如4-羟基二苯胺和羟甲基三聚氰胺的缩合产物或 通过在磷酸或硫酸的介质中的反应和（b）能够强烈吸收UV或远紫外光的叠氮化合物的反应而得到的烷氧基化羟甲基三聚氰胺。 该组合物提供在后烘烤中具有高耐热性的光致抗蚀剂层和在用于半导体处理的干蚀刻中遇到的气体等离子体的侵蚀。

    Photosensitive composition
    8.
    发明授权
    Photosensitive composition 失效
    感光组合物

    公开(公告)号：US4442196A

    公开(公告)日：1984-04-10

    申请号：US207087

    申请日：1980-11-14

    申请人： Akio Iwaki ,  Noriyasu Kita ,  Tatsuya Sasazawa ,  Hiroyoshi Yamaguchi

    发明人： Akio Iwaki ,  Noriyasu Kita ,  Tatsuya Sasazawa ,  Hiroyoshi Yamaguchi

    IPC分类号： C08F8/00 ,  C08F2/46 ,  C08F8/30 ,  C08F8/32 ,  C08F290/00 ,  C08F299/00 ,  G03F7/012 ,  G03F7/038 ,  H01L21/027 ,  H05K3/00 ,  G03C1/52

    CPC分类号： G03F7/012 ,  C08F8/30

    摘要： The main photosensitive ingredient of the photosensitive composition is prepared by subjecting a polymer, which is obtained by homopolymerizing, or copolymerizing with another copolymerizable monomer, a monomer of the general formula ##STR1## in which R represents a hydrogen atom, a halogen atom, or an alkyl group, Y represents a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group, p is 0 or 1, and when p=1, X represents a divalent organic group, to reaction with p-azidocinnamylidene-.alpha.-cyanoacetic chloride in the presence of an organic or inorganic base.

    摘要翻译： 感光性组合物的主要感光性成分是通过将通过均聚或与其它可共聚单体共聚得到的聚合物与通式“IMAGE”的单体（其中R表示氢原子），卤原子或 烷基，Y表示取代或未取代的亚苯基或取代或未取代的亚萘基，p为0或1，当p = 1时，X表示二价有机基团，与对叠氮杂亚麻基-α-氰基乙酰氯反应 在有机或无机碱的存在下。

    Novel compositions
    9.
    发明授权
    Novel compositions 失效
    新组合

    公开(公告)号：US3763118A

    公开(公告)日：1973-10-02

    申请号：US3763118D

    申请日：1972-04-24

    申请人： UPJOHN CO

    发明人： ULRICH H ,  STUBER F

    IPC分类号： C08F20/00 ,  C08F8/00 ,  C08F8/34 ,  C08F20/38 ,  D06P3/00 ,  D06P5/00 ,  G03F7/012 ,  C08F27/06 ,  C08F27/08 ,  C08F27/12

    CPC分类号： G03F7/012 ,  C08F8/00 ,  C08F8/34 ,  C08F20/02

    摘要： RADIATION (THERMAL AND LIGHT)-SENSITIVE POLYMERS ARE PROVIDED CHARACTERIZED BY THE PRESENCE, IN COMBINATION IN THE SAME MOLECULE, OF EACH OF TWO RECURRING UNITS, EACH UNIT CORRESPONDING TO THE FORMULA:

    -CH(-COO-X)-CH(-COO-Y)-CH(-R1)-CH2-

    WHERE R1=LOWER-ALKOXY OR PHENYL. IN THE CASE OF ONE OF THE TWO UNITS, ONE OF X AND Y REPRESENTS HYDROGEN AND THE OTHER REPRESENTS DIALKYLAMINOHYDROCARBYL; IN THE CASE OF THE SECOND UNIT, ONE OF X AND Y REPRSENTS HYDROGEN AND THE OTHER REPRESENTS:

    ((N3-SO2)X,(R6)Y-PHENYL)-NH-COO-A-

    WHERE A=ALKYLENE FROM 2 TO 10 CARBON ATOMS HAVING FROM 2 TO 6 CARBON ATOMS BETWEEN VALENCIES, R6=LOWERALKYL OR HALOGEN, X=1 OR 2, Y=0 TO 2 AND X+=1 TO 3. WATER SOLUBLE SALTS ARE ALSO DISCLOSED. THE ABOVE POLYMERS ARE USEFUL FOR CHEMICALLY BONDING ACID OR BASIC DYESTUFFS TO NON-DYE RECEPTIVE SUBSTRATES (E.G. POLYETHYLENE) BY COATING THE SUBSTRATE WITH THE ABOVE POLYMER AND EXPOSING THE COATED SUBSTRATE TO IRRADIATION. THE TREATED SUBSTRATE IS THEN CONTACTED WITH AN ACID, DIRECT, OR BASIC DYESTUFF. THE IRRADIATION CAN BE CARRIED OUT IMAGEWISE, AND THE IMAGE DEVELOPMENT BY REMOVING THE UNEXPOSED POLYMER PRIOR TO APPLICATION OF THE DYE. BONDING OF THE RADIATION-SENSITIVE POLYMERS OF THE INVENTION TO SUBSTRATES IN THE ABOVE MANNER CAN ALSO BE EMPOLYED AS A MEANS OF RENDERING HYDROPHILLIC A VARIETY OF SUBSTRATES WHICH ARE NORMALLY HYDROPHOBIC.