公开(公告)号：US20120161609A1

公开(公告)日：2012-06-28

申请号：US13394521

申请日：2010-09-06

申请人： Shingo Ono ,  Toshihisa Suyama ,  Kentaro Fukuda ,  Sumito Ishizu ,  Noriaki Kawaguchi ,  Tomohito Nagami ,  Akira Yoshikawa ,  Takayuki Yanagida ,  Yui Yokota

发明人： Shingo Ono ,  Toshihisa Suyama ,  Kentaro Fukuda ,  Sumito Ishizu ,  Noriaki Kawaguchi ,  Tomohito Nagami ,  Akira Yoshikawa ,  Takayuki Yanagida ,  Yui Yokota

IPC分类号： H01J63/04

CPC分类号： H05B33/14 ,  C09K11/7773 ,  H01J29/20 ,  H01J63/06 ,  H05B33/145

摘要： A vacuum ultraviolet light emitting device comprising: a luminescence substrate which is composed of a transparent substrate of lithium fluoride, magnesium fluoride, calcium fluoride, barium fluoride or the like, and a metal fluoride thin-film layer formed on the transparent substrate and being a thin-film layer of a metal fluoride such as LuLiF4, LaF3, BaF2 or CaF2, the metal fluoride being doped with atoms of neodymium (Nd), thulium (Tm), erbium (Er) or the like; and an electron beam source such as a thermionic emission gun or a field emission gun, wherein the luminescence substrate and the electron beam source are disposed in a vacuum atmosphere, and the metal fluoride thin-film layer is irradiated with electron beams from the electron beam source to emit light including wavelength components of vacuum ultraviolet light.

摘要翻译： 一种真空紫外线发光装置，其特征在于，具备：由氟化锂，氟化镁，氟化钙，氟化钡等的透明基板和形成在所述透明基板上的金属氟化物薄膜层构成的发光基板， 诸如LuLiF4，LaF3，BaF2或CaF2的金属氟化物的薄膜层，金属氟化物掺杂有钕（Nd），ium（Tm），铒（Er）等原子; 以及诸如热电子发射枪或场发射枪的电子束源，其中发光基板和电子束源设置在真空气氛中，并且金属氟化物薄膜层被来自电子束的电子束照射 源发射包括真空紫外光的波长分量的光。