摘要:
A projection type display device is provided to display high quality images. In the device, a WB-PBSW 2 is inclined to liquid crystal display devices 1r, 1b, 1g and has wire grids 2a parallel with a first substrate 11. One of directions of projection lines obtained by projecting the wire grids 2a on a second substrate 12 vertically, the one direction being directed to a direction where one extension surface of the polarization spectroscopic surface intersects with another extension surface of the second substrate when the one direction is turned in the counterclockwise direction by 90°, is defined as X-axis. If the liquid crystal display devices 1r, 1b, 1g are a type of first twist (normal twist), device reference line vectors are located at 225°±10° in the counterclockwise direction in view from the first substrate 11. In case of a second twist (reverse twist) type, the device reference line vectors are located at 315°±10° in the counterclockwise direction in view from the first substrate 11.
摘要:
A projection type display device is provided to display high quality images. In the device, a WB-PBSW 2 is inclined to liquid crystal display devices 1r, 1b, 1g and has wire grids 2a parallel with a first substrate 11. One of directions of projection lines obtained by projecting the wire grids 2a on a second substrate 12 vertically, the one direction being directed to a direction where one extension surface of the polarization spectroscopic surface intersects with another extension surface of the second substrate when the one direction is turned in the counterclockwise direction by 90°, is defined as X-axis. If the liquid crystal display devices 1r, 1b, 1g are a type of first twist (normal twist), device reference line vectors are located at 225°±10° in the counterclockwise direction in view from the first substrate 11. In case of a second twist (reverse twist) type, the device reference line vectors are located at 315°±10° in the counterclockwise direction in view from the first substrate 11.
摘要:
A reflective liquid crystal display device combined with an optical system with a wire grid is provided for light modulation by a liquid crystal layer. This layer, made of nematic liquid crystal having negative dielectric anisotropy, is formed such that first and second orientation directions on first and second substrates are rotated by “60±α” and “60±β” degrees in first and second rotating directions starting from a reference direction, respectively. The first and second rotating directions are mutually opposite, the reference direction is parallel to the first and second substrates and within in an angular range defined by a central angle plus ±5 degrees wherein the central angle is ±45 degrees from an oscillation direction of incident polarized light, and a relationship of |α|+|β|≦10 (α and β are zero or positive integers) is fulfilled.
摘要:
A reflective liquid crystal display device combined with an optical system with a wire grid is provided for light modulation by a liquid crystal layer. This layer, made of nematic liquid crystal having negative dielectric anisotropy, is formed such that first and second orientation directions on first and second substrates are rotated by “60±α” and “60±β” degrees in first and second rotating directions starting from a reference direction, respectively. The first and second rotating directions are mutually opposite, the reference direction is parallel to the first and second substrates and within in an angular range defined by a central angle plus ±5 degrees wherein the central angle is ±45 degrees from an oscillation direction of incident polarized light, and a relationship of |α|+|β|≦10 (α and β are zero or positive integers) is fulfilled.
摘要:
A reflective liquid crystal display device combined with an optical system with a wire grid is provided for light modulation by a liquid crystal layer. This layer, made of nematic liquid crystal having negative dielectric anisotropy, is formed such that first and second orientation directions on first and second substrates are rotated by “60±α” and “60±β” degrees in first and second rotating directions starting from a reference direction, respectively. The first and second rotating directions are mutually opposite, the reference direction is parallel to the first and second substrates and within in an angular range defined by a central angle plus ±5 degrees wherein the central angle is ±45 degrees from an oscillation direction of incident polarized light, and a relationship of |α|+|β|≦10 (α and β are zero or positive integers) is fulfilled.
摘要:
A reflective liquid crystal display device combined with an optical system with a wire grid is provided for light modulation by a liquid crystal layer. This layer, made of nematic liquid crystal having negative dielectric anisotropy, is formed such that first and second orientation directions on first and second substrates are rotated by “60±α” and “60±β” degrees in first and second rotating directions starting from a reference direction, respectively. The first and second rotating directions are mutually opposite, the reference direction is parallel to the first and second substrates and within in an angular range defined by a central angle plus ±5 degrees wherein the central angle is ±45 degrees from an oscillation direction of incident polarized light, and a relationship of |α|+|β|≦10 (α and β are zero or positive integers) is fulfilled.
摘要:
The present invention provides a thin cast strip or a thin steel sheet having good cast strip properties and mechanical properties from a molten steel containing a large amount of iron scrap containing Cu and Sn. The thin cast strip or thin steel sheet is characterized by being a thin cast strip or thin steel sheet of a common carbon steel comprising 0.15 to 10% by weight of Cu and 0.03 to 0.5% by weight of Sn, the primary dendrite spacing on a surface layer portion being in the range of from 5 to 100 .mu.m.
摘要:
An alignment layer to be used for liquid crystal displays each having at least two substrates with liquid crystals sealed therebetween is formed as follows. The substrates placed on each of several substrate trays are heated in a first load-lock chamber. At least one of the two substrates is irradiated with evaporated particles of oxide silicon (SiOx: 1.0≦×≦2.0) by vacuum deposition at an angle in the range from 45° to 60° from a direction of the normal line on the substrate surface to form an alignment layer thereon while the substrate trays are being moved in a layer-deposition chamber intermittently or sequentially. The substrate trays are cooled in a second load-lock chamber, thus producing substrates each formed the alignment layer thereon. The deposition chamber may be set under a requirement 0≦&Dgr;&thgr;≦3° in &Dgr;&thgr;=tan−1)dcos &thgr;/(D+d sin &thgr;)), “d” a distance from the substrate center to the center of a substrate edge, “D” a distance from the substrate center to the center of an evaporation source containing the oxide silicon, and &thgr; an angle formed between a direction in which the normal line extends on the substrate center and another direction in which evaporated particles of oxide silicon are deposited on the substrate center from the evaporation source. The alignment layer may be formed at an angle of layer deposition in the range from 3° to 10°.
摘要:
An alignment layer to be used for liquid crystal displays each having at least two substrates with liquid crystals sealed therebetween is formed as follows: The substrates placed on each of several substrate trays are heated in a first load-lock chamber. At least one of the two substrates is irradiated with evaporated particles of oxide silicon (SiOx: 1.0≦×≦2.0) by vacuum deposition at an angle in the range from 45° to 60° from a direction of the normal line on the substrate surface to form an alignment layer thereon while the substrate trays are being moved in a layer-deposition chamber intermittently or sequentially. The substrate trays are cooled in a second load-lock chamber, thus producing substrates each formed the alignment layer thereon. The deposition chamber may be set under a requirement 0≦&Dgr;&thgr;≦3° in &Dgr;&thgr;=tan−1(d cos &thgr;/(D+d sin &thgr;)), “d” a distance from the substrate center to the center of a substrate edge, “D” a distance from the substrate center to the center of an evaporation source containing the oxide silicon, and &thgr; an angle formed between a direction in which the normal line extends on the substrate center and another direction in which evaporated particles of oxide silicon are deposited on the substrate center from the evaporation source. The alignment layer may be formed at an angle of layer deposition in the range from 3° to 10°.