Proactive arc management of a plasma load
    1.
    发明授权
    Proactive arc management of a plasma load 有权
    主动电弧管理等离子体负载

    公开(公告)号:US08552665B2

    公开(公告)日:2013-10-08

    申请号:US12859998

    申请日:2010-08-20

    IPC分类号: G05F1/00

    CPC分类号: H05H1/46 H05H2001/4682

    摘要: Proactive arc management systems and methods are disclosed. In many implementations, proactive arc management is accomplished by executing an arc handling routine in response to an actual arc occurring in the plasma load and in response to proactive arc handling requests in a sampling interval. The number of proactive arc handling requests in a sampling interval is a function of a proactive arc management count that in turn is a function of actual number of arcs in a preceding sampling interval. Accordingly during a present sampling interval proactive arc management executes arc handling for actual arcs in the present sampling interval and for each count in a proactive arc management count updated as a function of the number of arcs in the immediately preceding sampling interval.

    摘要翻译: 公开了主动弧管理系统和方法。 在许多实现中,主动电弧管理是通过响应于在等离子体负载中发生的实际电弧并且响应于采样间隔中的主动电弧处理请求执行电弧处理程序而实现的。 采样间隔中的主动弧处理请求的数量是主动弧管理计数的函数,而主动弧管理计数又是先前采样间隔中实际弧数的函数。 因此,在当前采样间隔期间,主动弧管理对当前采样间隔中的实际弧执行弧处理,并且以在紧接在前的采样间隔内的弧数的函数更新的主动弧管理计数中的每个计数。