SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    1.
    发明公开

    公开(公告)号:US20240290715A1

    公开(公告)日:2024-08-29

    申请号:US18399335

    申请日:2023-12-28

    Applicant: Socionext Inc.

    Inventor: Yasuhiko MAKI

    Abstract: In a semiconductor integrated circuit device, a first semiconductor chip includes: a buried power rail that supplies first power; and a power line that is provided in a layer above the buried power rail and supplies second power. The buried power rail receives supply of the first power from the back face of the first semiconductor chip via a first through electrode, and the power line receives supply of the second power from the back face of the first semiconductor chip via a second through electrode. The cross-sectional area of the second through electrode is greater than the cross-sectional area of the first through electrode.

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