公开(公告)号：US11149347B2

公开(公告)日：2021-10-19

申请号：US15575450

申请日：2016-05-04

申请人： SOLVAY SA ,  FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： Michael Pittroff ,  Robert Wieland ,  Jamila Boudaden

IPC分类号： C23C16/44 ,  B08B7/00 ,  H01J37/32 ,  B08B5/00 ,  B08B9/08 ,  H01L21/311

摘要： The present invention relates to a process for cleaning chambers of apparatus used for semiconductor manufacturing with a gas mixture comprising or consisting of fluorine, nitrogen and argon as well as said gas mixtures.

公开(公告)号：US20240025825A1

公开(公告)日：2024-01-25

申请号：US18247721

申请日：2021-09-28

申请人： Solvay SA

发明人： Joo-Hee Kang ,  Christian Groeber ,  Michael Pittroff ,  Denis Revelant

IPC分类号： C07C17/389 ,  B01D15/20 ,  C09K13/00

CPC分类号： C07C17/389 ,  B01D15/203 ,  C09K13/00

摘要： The present invention relates to a process for the purification of fluorinated olefins, in particular hexafluoro-1,3-butadiene, comprising a step wherein a liquid mixture comprising hexafluoro-1,3-butadiene in liquid phase is contacted with at least one adsorbent having an average pore size of less than 10 Å.