公开(公告)号：US20190388823A1

公开(公告)日：2019-12-26

申请号：US16563696

申请日：2019-09-06

申请人： Stamicarbon B.V.

发明人： Brian Sayre HIGGINS ,  John Marshall TATE, III ,  Robert Arthur YATES ,  Marcel Julien POMERLEAU ,  Jon Michael HEON ,  Wilfried Marc Renatt DIRKX ,  Juan Coloma GONZÁLEZ

IPC分类号： B01D47/10 ,  B01J2/04 ,  B01D53/40 ,  B01D53/58 ,  B01D53/79 ,  B01D47/05 ,  B01D47/06 ,  B01D47/12 ,  C07C273/16

摘要： Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).

公开(公告)号：US20170320816A1

公开(公告)日：2017-11-09

申请号：US15495667

申请日：2017-04-24

申请人： Stamicarbon B.V.

发明人： Brian Sayre HIGGINS ,  John Marshall TATE, III ,  Robert Arthur YATES ,  Marcel Julien POMERLEAU ,  Jon Michael HEON ,  Wilfried Marc Renaat DIRKX ,  Juan Coloma GONZÁLEZ

IPC分类号： C07C273/16 ,  B01D47/10 ,  B01D47/06 ,  B01D47/12 ,  B01D47/05

摘要： Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).