公开(公告)号：US10730002B2

公开(公告)日：2020-08-04

申请号：US15495667

申请日：2017-04-24

Applicant: Stamicarbon B.V.

Inventor： Brian Sayre Higgins ,  John Marshall Tate, III ,  Robert Arthur Yates ,  Marcel Julien Pomerleau ,  Jon Michael Heon ,  Wilfried Marc Renaat Dirkx ,  Juan Coloma González

IPC: B01D47/05 ,  B01D47/06 ,  B01D47/10 ,  B01D47/12 ,  B01D53/40 ,  B01D53/58 ,  B01D53/79 ,  C07C273/16 ,  B01J2/04 ,  C05C9/00

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).

公开(公告)号：US10722831B2

公开(公告)日：2020-07-28

申请号：US16563696

申请日：2019-09-06

Applicant: Stamicarbon B.V.

Inventor： Brian Sayre Higgins ,  John Marshall Tate, III ,  Robert Arthur Yates ,  Marcel Julien Pomerleau ,  Jon Michael Heon ,  Wilfried Marc Renatt Dirkx ,  Juan Coloma González

IPC: B01D47/05 ,  B01D47/06 ,  B01D47/10 ,  B01D47/12 ,  B01D47/00 ,  B01D53/40 ,  B01D53/58 ,  B01D53/79 ,  B01J2/04 ,  C07C273/16 ,  C05C9/00

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).