公开(公告)号：US5144363A

公开(公告)日：1992-09-01

申请号：US645158

申请日：1991-01-24

申请人： Stefan Wittekoek ,  Marinus A. Van Den Brink ,  Theodorus A. Fahner

发明人： Stefan Wittekoek ,  Marinus A. Van Den Brink ,  Theodorus A. Fahner

IPC分类号： G03F7/207 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F9/7049

摘要： A projection apparatus is described having a reference plate with a set of grating marks in X and Y directions for aligning with an exposure mask having similar marks, and having four detectors for each mark, and having a lens system for projecting only the relevant mark on the relevant detector. A method of projecting is also described in which the detection signals are simultaneously processed with other signals to result in a control signal to adjust image quality.

公开(公告)号：US4334139A

公开(公告)日：1982-06-08

申请号：US157993

申请日：1980-06-09

申请人： Stefan Wittekoek ,  Theodorus A. Fahner

发明人： Stefan Wittekoek ,  Theodorus A. Fahner

IPC分类号： H01L21/027 ,  H01J37/304 ,  B23K15/00

CPC分类号： H01J37/3045

摘要： An apparatus is described for writing patterns in a layer on a substrate by using a beam of electrically-charged particles. The apparatus is provided with an optical height-measuring system for determining a deviation between the desired and the actual position of the surface to be inscribed relative to the charged particle lens system. The deviation can be measured accurately and continuously without the use of additional markers on the substrate.

摘要翻译： 描述了通过使用带电粒子束来在基板上的层中书写图案的装置。 该设备设置有用于确定相对于带电粒子透镜系统要刻写的表面的期望和实际位置之间的偏差的光学高度测量系统。 可以准确和连续地测量偏差，而不需要在基板上使用额外的标记。

公开(公告)号：US4356392A

公开(公告)日：1982-10-26

申请号：US158653

申请日：1980-06-11

申请人： Stefan Wittekoek ,  Theodorus A. Fahner

发明人： Stefan Wittekoek ,  Theodorus A. Fahner

IPC分类号： H01L21/30 ,  G02B7/28 ,  G02B7/32 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G01J1/20

CPC分类号： G03F9/7026 ,  G03F7/70825

摘要： An optical imaging system is described which is provided with an opto-electronic detection system for determining a deviation between the image plane of the imaging system and a second plane on which an image is to be formed by the imaging system. After a first reflection on the second plane an auxiliary beam which is obliquely incident on said plane is reflected along itself and mirror-inverted, is subsequently reflected a second time on the second plane, and is finally incident on two detectors. The difference signal of the detectors, which is a measure of the deviation, is unaffected by tilting of the second plane and by local variations in reflectivity of in said plane.

摘要翻译： 描述了一种光学成像系统，其具有光电检测系统，用于确定成像系统的图像平面与成像系统将在其上形成图像的第二平面之间的偏差。 在第二平面上的第一反射之后，倾斜地入射在所述平面上的辅助光束自身被反射并镜像反射，随后在第二平面上被反射第二次，最后入射到两个检测器上。 作为偏差的度量的检测器的差分信号不受第二平面的倾斜和所述平面中的反射率的局部变化的影响。