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公开(公告)号：US12130557B2
公开(公告)日：2024-10-29
申请号：US17885353
申请日：2022-08-10
申请人： Carl Zeiss SMT GmbH
发明人： Matthias Manger , Markus Raab
IPC分类号： G03F7/00
CPC分类号： G03F7/70266 , G03F7/70825 , G03F7/7085 , G03F7/70891
摘要： An optical system comprises at least one mirror having a mirror body and a mirror surface, and at least one actuator device coupled to the mirror body and serving for deforming the mirror surface. The actuator device comprises at least one electrostrictive actuator element for generating a mechanical stress in the mirror body for deforming the mirror surface depending on an electrical drive voltage, and at least one electrostrictive sensor element for outputting a sensor signal depending on a deformation of the sensor element. The at least one sensor element is arranged directly adjacent to the actuator element and/or is arranged in such a way that it is configured at least partly for transferring the mechanical stress generated by the actuator element to the mirror body.
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公开(公告)号：US20240329547A1
公开(公告)日：2024-10-03
申请号：US18612976
申请日：2024-03-21
发明人： Shinichi MACHIDORI
IPC分类号： G03F7/00
CPC分类号： G03F7/70825 , G03F7/707 , G03F7/70933
摘要： A substrate processing apparatus includes: a base including a drive mechanism; a cover enclosing the base; a lifting body protruding from an internal region enclosed by the cover to an external region outside the internal region, and moving up and down with respect to the base by the drive mechanism; a processing body that is connected to the lifting body in the external region, and processes a substrate; and a suction tube with a suction port for sucking particles generated from the drive mechanism.
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3.发明公开公开(公告)号：US20240264524A1
公开(公告)日：2024-08-08
申请号：US18107093
申请日：2023-02-08
发明人： Kai Siu LAM , Nim Tak WONG , Xiaodong CHEN , Kui Kam LAM
CPC分类号： G03F7/0002 , G03F7/70616 , G03F7/70716 , G03F7/70775 , G03F7/70825 , G03F7/70975
摘要： An apparatus for applying an adhesive fluid onto a bonding surface during a bonding process includes a positioning table, a dispensing device, a stamping device and a switching member which are mounted on the positioning table. The dispensing device is configured to be positionable by the positioning table to dispense the adhesive fluid onto the bonding surface. The stamping device is configured to be positionable by the positioning table to stamp the adhesive fluid onto the bonding surface. The dispensing device and stamping device are operative to apply the adhesive fluid onto different bonding positions on the bonding surface. The switching member coupled to the stamping device is configured to move the stamping device to a first standby position when the dispensing device is dispensing the adhesive fluid and to a second standby position when the stamping device is stamping the adhesive fluid.
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公开(公告)号：US20240152062A1
公开(公告)日：2024-05-09
申请号：US18354207
申请日：2023-07-18
发明人： Sukjong Bae , Kangho Park , Moongu Shin , Myoungsoo Lee , Hojune Lee
CPC分类号： G03F7/70716 , G03F7/2004 , G03F7/70075 , G03F7/70758 , G03F7/70825 , G03F7/7085
摘要： A mask exposure system includes a chamber, a stage configured to receive a mask, one or more mask temperature sensors, a beam source configured to irradiate an electron beam on the mask, a deflector configured to adjust a position at which the electron beam is irradiated on the mask by deflecting the electron beam based on a voltage level applied to the deflector, in the chamber, a chamber temperature sensor configured to measure an internal temperature of the chamber, and a controller configured to control a direction of deflection and a degree of deflection of the electron beam the deflector. The controller is configured to correct the voltage level applied to the deflector based on a difference between the temperature of the mask and the chamber.
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公开(公告)号：US20240027922A1
公开(公告)日：2024-01-25
申请号：US18224063
申请日：2023-07-20
申请人： STEK CO., LTD.
发明人： Ming-Sheng Chen
CPC分类号： G03F7/70825 , G03F7/70716 , G03F7/7085 , G03F1/84
摘要： A mask inspection machine includes a platform unit for carrying a transparent container. The transparent container includes a lower window and an upper window. The platform unit includes a platform and a carrier. The platform includes a slot. The carrier is movable on the platform along the slot. The carrier includes a plate and guiding elements. The plate includes a support face including an inspection window corresponding to the lower window of the transparent container. The guiding elements are connected to the support face for guiding the transparent container onto the support face.
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公开(公告)号：US20230375945A1
公开(公告)日：2023-11-23
申请号：US17749037
申请日：2022-05-19
发明人： Ming-Yi SHEN , Yao-Fong DAI , Yuan-Hsin CHI , Sheng-Yuan LIN
IPC分类号： G03F7/20
CPC分类号： G03F7/70825 , H01L21/67742
摘要： The present disclosure is directed to workpiece support for supporting a workpiece during semiconductor processing. The workpiece support includes one or more support frame bodies including a plurality of spaced apart spacers on a first surface of the support frame bodies. The spacers include a first surface spaced apart from the first surface of the support frame body. The spacing between the first surface of the spacers and the first surface of the support frame body results in the underside of the workpiece contacting the spacers but not contacting the first surface of the support frame body. Portions of the underside of the workpiece that do not contact the first surface of the support frame body are less susceptible to damage or accumulation of unwanted debris.
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公开(公告)号：US11703770B2
公开(公告)日：2023-07-18
申请号：US17354212
申请日：2021-06-22
申请人： Carl Zeiss SMT GmbH
发明人： Eylem Bektas Knauf , Ulrich Schoenhoff , Marwène Nefzi , Ralf Zweering , Konrad Carl Steimer , Yim-Bun Patrick Kwan
CPC分类号： G03F7/709 , G03F7/70483 , G03F7/70825
摘要： An arrangement of a microlithographic optical imaging device includes first and supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device configured to measure the position and/or orientation of the optical element in relation to a reference in at least one degree of freedom and up to all six degrees of freedom in space. A creep compensation device compensates a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.
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公开(公告)号：US20230195001A1
公开(公告)日：2023-06-22
申请号：US18063410
申请日：2022-12-08
申请人： Semes Co., Ltd.
发明人： Jong Kook Bae , Tae Won Yun , Chang Ho Kim , Hyun Yang Jeong , Sung Hun Eom
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/2041 , G03F7/70825
摘要： Disclosed are a buffer unit, in which a plurality of support plates is stacked in a vertical direction and a connection block is provided between the plurality of support plates to prevent vibration generated at the lower end of the support plate from being transmitted from the upper support plate, and a substrate treating apparatus. According to the present invention, it is possible to reduce the vibration generated in the buffer unit, so that there is an effect of improving the efficiency of the substrate treating process.
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公开(公告)号：US11644748B2
公开(公告)日：2023-05-09
申请号：US17226775
申请日：2021-04-09
CPC分类号： G03F1/82 , G03F7/168 , G03F7/70825 , G03F7/70841 , G03F7/70875
摘要： Embodiments of baking chambers for baking a photomask are provided herein. In some embodiments, a baking chamber includes: a chamber body enclosing a first interior volume and a second interior volume, disposed beneath and fluidly independent from the first interior volume; a radiant heat source disposed in the first interior volume; a photomask support structure configured to support a photomask disposed in the second interior volume; a window disposed between the first interior volume the second interior volume, wherein the window is made of a material that is transparent to thermal radiation; a first gas inlet and a first gas outlet coupled to the first interior volume; and a second gas inlet and a second gas outlet coupled to the second interior volume on opposite ends thereof to facilitate flow of a process gas laterally through the second interior volume and across the photomask support structure.
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公开(公告)号：US20190094705A1
公开(公告)日：2019-03-28
申请号：US16204519
申请日：2018-11-29
申请人： Carl Zeiss SMT GmbH
发明人： Jens Kugler , Stefan Hembacher , Michaela Schmid , Bernhard Geuppert , Burkhard Corves , Martin Riedel , Martin Wahle , Mathias Huesing , Michael Lorenz , Tim Detert , Marwène Nefzi
CPC分类号： G03F7/70258 , G02B7/023 , G02B7/182 , G02B7/1827 , G03F7/70191 , G03F7/70825
摘要： An optical imaging arrangement includes an optical element unit, and an actuator device connected to the optical element unit and is configured to be connected to a support structure for supporting the optical unit. The actuator device is configured to: actively adjust, in an adjustment state, a position and/or an orientation of the optical unit with respect to the support structure in N degrees of freedom; and support the optical element unit in a statically overdetermined manner in at least one of the N degrees of freedom via a plurality of active first and second actuator components such that, in a holding state following the adjustment state, the first and second actuator components cause a parasitic residual load introduced into the optical element unit in the at least one of the N degrees of freedom.
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