公开(公告)号：US07502658B1

公开(公告)日：2009-03-10

申请号：US12033502

申请日：2008-02-19

申请人： Steven G. Barbee ,  Jeong W. Nam ,  Viorel Ontalus ,  Yuusheng Song

发明人： Steven G. Barbee ,  Jeong W. Nam ,  Viorel Ontalus ,  Yuusheng Song

IPC分类号： G06F19/00

CPC分类号： G05B19/41865 ,  G05B2219/32191 ,  G05B2219/32204 ,  G05B2219/32291 ,  G05B2219/32324 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/22

摘要： An exemplary method for performing fabrication sequence analysis, the method comprising, defining a process group, wherein a process group includes fabrication processes in a fabrication sequence, determining fabrication process paths in the process group to define independent variables, wherein a process path is a plurality of fabrication equipment used to fabricate a particular semiconductor device in the fabrication sequence, receiving a dependent variable for the fabrication sequence, performing analysis of variance to calculate a p-value for the process group, determining whether the p-value is lower than a threshold value, identifying a poor process path responsive to determining that the p-value is lower than a threshold value, and outputting the identified poor process path.

摘要翻译： 一种用于执行制造序列分析的示例性方法，所述方法包括：定义过程组，其中过程组包括制造序列中的制造过程，确定所述过程组中的制造过程路径以定义独立变量，其中过程路径是多个 用于在制造序列中制造特定半导体器件的制造设备，接收制造序列的因变量，执行方差分析以计算过程组的p值，确定p值是否低于阈值 值，识别响应于确定所述p值低于阈值的差的处理路径，以及输出所识别的不良处理路径。