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130 条记录 (耗时 0.016 秒)

    Identifying failures in an aeroengine
    4.
    发明授权
    Identifying failures in an aeroengine 有权
    识别航空发动机的故障

    公开(公告)号：US08682616B2

    公开(公告)日：2014-03-25

    申请号：US13139774

    申请日：2009-12-14

    申请人： Jérôme Lacaille

    发明人： Jérôme Lacaille

    IPC分类号： G06F15/18

    CPC分类号： G05B23/024 ,  G05B23/0281 ,  G05B2219/32191 ,  G05B2219/32201 ,  Y02P90/22

    摘要： A method and a system for identifying failures in an aeroengine. The system includes: a mechanism defining a set of standardized indicators representative of operation of the aeroengine; a mechanism constructing an anomaly vector representative of a behavior of the engine as a function of the set of standardized indicators; a mechanism selecting in an event of an anomaly being revealed by the anomaly vector a subset of reference vectors having directions belonging to a determined neighborhood of a direction of the anomaly vector, the subset of reference vectors being selected from a set of reference vectors associated with failures of the aeroengine and determined using criteria established by experts; and a mechanism identifying failures associated with the subset of reference vectors.

    摘要翻译： 用于识别航空发动机故障的方法和系统。 该系统包括：定义表示航空发动机的操作的一组标准化指标的机构; 构成表示作为该组标准化指标的函数的发动机的行为的异常矢量的机构; 在异常矢量的情况下，选择异常的机制，具有属于确定的异常矢量方向的邻域的方向的参考矢量的子集，参考矢量的子集选自与 航空发动机的故障并根据专家确定的标准确定; 以及识别与参考矢量子集相关联的故障的机制。

    Method for controlling critical dimension in semiconductor production process, and semiconductor manufacturing line supporting the same
    5.
    发明授权
    Method for controlling critical dimension in semiconductor production process, and semiconductor manufacturing line supporting the same 失效
    用于控制半导体生产过程中的关键尺寸的方法，以及支持其的半导体制造线

    公开(公告)号：US08392010B2

    公开(公告)日：2013-03-05

    申请号：US12912935

    申请日：2010-10-27

    申请人： Eugene Kang ,  Won-Hyouk Jang ,  Joo-Hwa Lee

    发明人： Eugene Kang ,  Won-Hyouk Jang ,  Joo-Hwa Lee

    IPC分类号： G06F19/00 ,  G05B13/02

    CPC分类号： G05B19/41875 ,  G05B2219/32177 ,  G05B2219/32191 ,  G05B2219/32201 ,  G05B2219/45031 ,  Y02P90/22

    摘要： A critical dimension controlling method in a semiconductor production process includes determining whether a model is to undergo a discontinuous production process when a run is inserted in a semiconductor manufacturing line, applying an offset for said model or a common offset for a model group including said model according to the determination, executing a production process in dependence upon a process variation along with the offset for the model or the common offset for the model group, and measuring an actual critical dimension in the production process. The offset for the model is calculated based on a previously measured actual critical dimension, and the calculated offset for the model is applied to the calculation of the common offset for the model group.

    摘要翻译： 半导体制造过程中的关键尺寸控制方法包括：当在半导体制造线中插入运行时，确定模型是否经历不连续生产过程，对所述模型应用偏移量或对包括所述模型的模型组应用偏移量 根据确定，根据工艺变化以及模型组的偏移量或模型组的共同偏移量执行生产过程，并测量生产过程中的实际临界尺寸。 基于先前测量的实际临界尺寸计算模型的偏移量，并将模型的计算偏移量应用于模型组的公差值的计算。

    Expert knowledge methods and systems for data analysis
    7.
    发明申请
    Expert knowledge methods and systems for data analysis 审中-公开

    公开(公告)号：US20100100221A1

    公开(公告)日：2010-04-22

    申请号：US12653598

    申请日：2009-12-15

    申请人： Puneet Yadav ,  Andrew D. Bailey, III

    发明人： Puneet Yadav ,  Andrew D. Bailey, III

    IPC分类号： G05B13/04 ,  G06F17/18 ,  G06F15/18

    CPC分类号： G05B19/41875 ,  G05B2219/31352 ,  G05B2219/32191 ,  Y02P90/22

    摘要： A method for adjusting a data set defining a set of process runs, each process run having a set of data corresponding to a set of variables for a wafer processing operation is provided. A model derived from a data set is received. A new data set corresponding to one process run is received. The new data set is projected to the model. An outlier data point produced as a result of the projecting is identified. A variable corresponding to the one outlier data point is identified, the identified variable exhibiting a high contribution. A value for the variable from the new data set is identified. Whether the value for the variable is unimportant is determined. A normalized matrix of data is created, using random data and the variable that was determined to be unimportant from each of the new data set and the data set. The data set is updated with the normalized matrix of data.

    METHOD AND SYSTEM FOR DEFECT DETECTION IN MANUFACTURING INTEGRATED CIRCUITS
    8.
    发明申请
    METHOD AND SYSTEM FOR DEFECT DETECTION IN MANUFACTURING INTEGRATED CIRCUITS 有权
    制造集成电路缺陷检测方法与系统

    公开(公告)号：US20100004775A1

    公开(公告)日：2010-01-07

    申请号：US12258786

    申请日：2008-10-27

    申请人： Paul Kuang-Chi Lin ,  Sophia Zhang

    发明人： Paul Kuang-Chi Lin ,  Sophia Zhang

    IPC分类号： G06N5/02 ,  G06F19/00 ,  G06F17/30 ,  G06F17/40

    CPC分类号： G05B19/41875 ,  G05B2219/32191 ,  G05B2219/32221 ,  G05B2223/02 ,  H01L22/12 ,  Y02P90/22

    摘要： Method and system for defect detection in manufacturing integrated circuits. In an embodiment, the invention provides a method for identifying one or more sources for possible causing manufacturing detects in integrated circuits. The method includes a step for providing a plurality of semiconductor substrates. The method includes a step for processing the plurality of semiconductor substrates in a plurality of processing steps using a plurality of processing tools. The method additionally includes a step for providing a database, which includes data associated with the processing of the plurality of semiconductor substrates. The method further includes a step for testing the plurality of semiconductor wafers after the processing of the plurality of semiconductor substrates. Additionally, the method includes a step for detecting at least one defect characteristic associated with the plurality of the semiconductor substrates that have been processed. Moreover, the method includes a step for identifying a set of processing steps. For example, the set of processing step are possibly associated with the defect characteristic.

    摘要翻译： 制造集成电路中缺陷检测的方法和系统。 在一个实施例中，本发明提供了用于识别一个或多个源的方法，用于在集成电路中可能导致制造检测。 该方法包括提供多个半导体衬底的步骤。 该方法包括使用多个处理工具在多个处理步骤中处理多个半导体衬底的步骤。 该方法还包括提供数据库的步骤，数据库包括与多个半导体衬底的处理相关联的数据。 该方法还包括在多个半导体衬底的处理之后测试多个半导体晶片的步骤。 此外，该方法包括用于检测与已经处理的多个半导体衬底相关联的至少一个缺陷特性的步骤。 此外，该方法包括用于识别一组处理步骤的步骤。 例如，该组处理步骤可能与缺陷特性相关联。

    Dual-phase virtual metrology method
    9.
    发明授权
    Dual-phase virtual metrology method 有权
    双相虚拟计量方法

    公开(公告)号：US07603328B2

    公开(公告)日：2009-10-13

    申请号：US11879562

    申请日：2007-07-18

    申请人： Fan-Tien Cheng ,  Hsien-Cheng Huang ,  Chi-An Kao

    发明人： Fan-Tien Cheng ,  Hsien-Cheng Huang ,  Chi-An Kao

    IPC分类号： G06E1/00 ,  G06E3/00 ,  G06F15/18 ,  G06G7/00 ,  G06N3/02

    CPC分类号： G05B19/41875 ,  G05B2219/32191 ,  G05B2219/32195 ,  G05B2219/32206 ,  G05B2219/37224 ,  Y02P90/22

    摘要： A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.

    摘要翻译： 公开了一种双相虚拟测量方法，用于通过产生双相虚拟测量（VM）值来及时和准确地考虑其中，其中，阶段I推测步骤通过立即计算第I阶虚拟测量值（VMI） 一旦工件的整个工艺数据被完全收集， 并且阶段II推测步骤增强精度，其不会重新计算盒中所有工件的阶段II虚拟测量值（VMII），直到实际测量值（调谐或重新训练目的所需）为止 在同一盒中选择的工件被收集。 此外，还产生了每个VMI和VMII的伴随依赖指数（RI）和全局相似性指数（GSI）。

    Method and system for scheduling a set of events in real time
    10.
    发明申请
    Method and system for scheduling a set of events in real time 审中-公开
    实时调度一组事件的方法和系统

    公开(公告)号：US20090222123A1

    公开(公告)日：2009-09-03

    申请号：US12291238

    申请日：2008-11-07

    申请人： Kevin Nevills ,  Ashok Erramilli ,  Vishnu Erramilli ,  Srinivas Netrakanti ,  Erwin Paes ,  Robert Stawicki

    发明人： Kevin Nevills ,  Ashok Erramilli ,  Vishnu Erramilli ,  Srinivas Netrakanti ,  Erwin Paes ,  Robert Stawicki

    IPC分类号： G06F19/00

    CPC分类号： G06Q10/06 ,  G05B19/41865 ,  G05B2219/32191 ,  G05B2219/32291 ,  Y02P90/20 ,  Y02P90/22

    摘要： A method and system for generating/regenerating a schedule of a set of events associated with at least one process in a manufacturing plant in real time. The schedule is generated/regenerated on the basis of the occurrence of one or more events associated with various processes in real time. The occurrence of each of the events is monitored continuously. Thereafter, the occurrence of the monitored events is predicted for one or more predefined instances of time. The schedule is optimized on the basis of the predicted occurrences of the monitored events to generate/regenerate the schedule. The optimized schedule may be used to control one or more automatons.

    摘要翻译： 一种用于生成/再生与制造工厂中的至少一个过程相关联的一组事件的实时调度的方法和系统。 基于与各种处理相关联的一个或多个事件的实时生成/生成该调度。 每个事件的发生被连续地监视。 此后，针对一个或多个预定时间实例来预测监视事件的发生。 根据监测事件的预测事件来生成/重新生成计划，优化排程。 优化的时间表可以用于控制一个或多个自动机。