公开(公告)号：US20050012975A1

公开(公告)日：2005-01-20

申请号：US10910525

申请日：2004-08-02

Applicant: Steven George ,  Cari Herrmann

Inventor： Steven George ,  Cari Herrmann

IPC: B81B3/00 ,  B81C1/00 ,  G02B26/08

CPC classification number: G02B26/0866 ,  B81B3/0005 ,  B81C1/0096 ,  B81C2201/112 ,  B82Y30/00 ,  G02B26/0833

Abstract: Micro-mechanical devices, such as MEMS, having layers thereon, and methods of forming the layers, are disclosed. In one aspect, a method may include forming a layer including an oxide of aluminum over at least a portion of a micro-mechanical device, and coating the layer by bonding material to surface hydroxyl groups of the layer. In another aspect, a method may include introducing a micro-mechanical device into an atomic layer deposition chamber, and substantially filling nanometer sized voids of the micro-mechanical device by using atomic layer deposition to introduce material into the voids. In a still further aspect, a method may include introducing an alkylaminosilane to a micro-mechanical device having a surface hydroxyl group, and bonding a silane to the micro-mechanical device by reacting the alkylaminosilane with the surface hydroxyl group.

Abstract translation: 公开了诸如MEMS的微机械装置，其上具有层，以及形成层的方法。 在一个方面，一种方法可以包括在微机械装置的至少一部分上形成包括铝氧化物的层，并且通过将材料粘合到该层的表面羟基上来涂覆该层。 在另一方面，一种方法可以包括将微机械装置引入原子层沉积室，并且通过使用原子层沉积将材料引入空隙中，基本上填充微机械装置的纳米尺寸的空隙。 在另一方面，一种方法可以包括将烷基氨基硅烷引入到具有表面羟基的微机械装置中，并且通过使烷基氨基硅烷与表面羟基反应将硅烷键合到微机械装置。