摘要:
First and second apparent resistance measures are determined for an integrated circuit and utilized to characterize the integrated circuit. The first apparent resistance measure is determined for the integrated circuit based on a first voltage drop and a first current that are measured using test equipment. The second apparent resistance measure is determined for the integrated circuit based on a second voltage drop and a second current that are obtained using static analysis of a corresponding integrated circuit design. The integrated circuit is characterized based on a comparison of the first and second apparent resistance measures. For example, characterizing the integrated circuit may comprise validating the static analysis of the integrated circuit design based on the comparison of the first and second apparent resistance measures, or determining a quality measure of the integrated circuit based on the comparison of the first and second apparent resistance measures.
摘要:
First and second apparent resistance measures are determined for an integrated circuit and utilized to characterize the integrated circuit. The first apparent resistance measure is determined for the integrated circuit based on a first voltage drop and a first current that are measured using test equipment. The second apparent resistance measure is determined for the integrated circuit based on a second voltage drop and a second current that are obtained using static analysis of a corresponding integrated circuit design. The integrated circuit is characterized based on a comparison of the first and second apparent resistance measures. For example, characterizing the integrated circuit may comprise validating the static analysis of the integrated circuit design based on the comparison of the first and second apparent resistance measures, or determining a quality measure of the integrated circuit based on the comparison of the first and second apparent resistance measures.