CUTTING TOOL AND METHOD FOR MANUFACTURING THE SAME

    公开(公告)号:US20230234141A1

    公开(公告)日:2023-07-27

    申请号:US17794989

    申请日:2022-01-25

    摘要: A cutting tool includes a substrate and a coating film, wherein the coating film has a first layer formed from a plurality of hard grains, the hard grains are made of TiSiCN having a cubic crystal structure, the hard grains have a lamellar structure in which a layer having a relatively high silicon concentration and a layer having a relatively low silicon concentration are alternately stacked, and a maximum value of percentage of number ASi of silicon atoms to a sum of the number ASi of silicon atoms and number ATi of titanium atoms in a grain boundary region between the hard grains, {ASi/(ASi+ATi)}×100, is larger than an average value of percentage of number BSi of silicon atoms to a sum of the number BSi of silicon atoms and number BTi of titanium atoms in the first layer, {BSi/(BSi+BTi)}×100.

    CUTTING TOOL
    2.
    发明公开
    CUTTING TOOL 审中-公开

    公开(公告)号:US20240066605A1

    公开(公告)日:2024-02-29

    申请号:US18026595

    申请日:2022-08-30

    IPC分类号: B23B27/16 B23B27/14

    摘要: A cutting tool including a substrate and a coating film disposed on the substrate, wherein the cutting tool includes: a rake face, a flank face contiguous to the rake face; and a cutting edge region composed of a boundary part between the rake face and the flank face, wherein the coating film includes a TiSiCN layer, the TiSiCN layer has: a first TiSiCN layer positioned in the rake face; and a second TiSiCN layer positioned in the cutting edge region, the first TiSiCN layer has a composition of Ti(1-Xr)SiXrCN, the second TiSiCN layer has a composition of Ti(1-Xe)SiXeCN, and the Xr and the Xe each represent 0.010 or more and 0.100 or less, and satisfy a relationship of Xr−Xe≥0.003.