摘要:
A semiconductor device includes a plurality of cell gate electrodes on a semiconductor substrate. End portions of the cell gate electrodes include stepped-pad regions that extend in a direction parallel to a surface of the semiconductor substrate. Vertical structures are on the semiconductor substrate and pass through the plurality of cell gate electrodes. The vertical structures respectively include a channel layer. Upper peripheral transistors are disposed on the semiconductor substrate. The upper peripheral transistors include an upper peripheral gate electrode at a level higher than a level of the plurality of cell gate electrodes, body patterns passing through the upper peripheral gate electrode and electrically connected to the pad regions, and gate dielectric layers between the upper peripheral gate electrode and the body patterns.
摘要:
The driving circuit for an NDRO-FRAM includes several NDRO-FRAM (Non Destructive Non Volatile Ferroelectric Random Access Memory) cells each having a drain, a bulk, a source and a gate and arranged as a matrix. A plurality of reading word lines are separately connected to each drain of the NDRO-FRAM cells arranged in columns, and a plurality of writing word lines are separately connected to each bulk of the NDRO-FRM cells arranged in columns. Several data level transmission circuits for transmitting a data level of the NDRO-FRAM cells are also included, which are connected to a plurality of data level transmission circuits. Accordingly, the present invention is capable of reading and writing of data on the NDRO-FRAM cells.