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公开(公告)号：US20180161953A1
公开(公告)日：2018-06-14
申请号：US15647444
申请日：2017-07-12
发明人： ChunHung CHEN , Jung-Yu LI , Sheng-Chen WANG , Shih-Sian HUANG
CPC分类号： B24B37/26 , B24B37/005 , B24B37/10 , B24B37/22 , B24B37/24 , B24B49/12 , B24B53/017
摘要： A polishing pad includes a first region having a first geometric property and a first material property. The polishing pad further includes a second region having a second geometric property and a second material property, wherein the second region is closer to an edge of the polishing pad than the first region. The first geometric property is different from the second geometric property; or the first material property is different from the second material property.
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公开(公告)号：US20210069855A1
公开(公告)日：2021-03-11
申请号：US16952901
申请日：2020-11-19
发明人： ChunHung CHEN , Jung-Yu LI , Sheng-Chen WANG , Shih-Sian HUANG
IPC分类号： B24B37/26 , B24B37/24 , B24B37/22 , B24B37/10 , B24B53/017 , B24B37/005 , B24B49/12
摘要： A method of using a polishing pad includes applying a slurry to a first location on the polishing pad. The method further includes rotating the polishing pad. The method further includes spreading the slurry across a first region of the polishing pad at a first rate, wherein the first region includes a plurality of first grooves, a first material property of the first region varies in a thickness direction of the polishing pad, each of the plurality of first grooves extends through at least two variations in the first material property, and the first material property comprises porosity, specific gravity or absorbance. The method further includes spreading the slurry across a second region of the polishing pad at a second rate different from the first rate, wherein the second region comprises a plurality of second grooves.
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公开(公告)号：US20240359288A1
公开(公告)日：2024-10-31
申请号：US18771492
申请日：2024-07-12
发明人： ChunHung CHEN , Jung-Yu LI , Sheng-Chen WANG , Shih-Sian HUANG
IPC分类号： B24B37/26 , B24B37/005 , B24B37/10 , B24B37/22 , B24B37/24 , B24B49/12 , B24B53/017
CPC分类号： B24B37/26 , B24B37/005 , B24B37/10 , B24B37/22 , B24B37/24 , B24B49/12 , B24B53/017
摘要： A method of using a polishing pad includes applying a slurry in a first region of the polishing pad. The method further includes spreading the slurry across the first region of the polishing pad at a first rate. The method further includes spreading the slurry across a second region at a second rate different from the first rate, wherein the second region is farther from a center of the polishing pad than the first region. The method further includes spreading the slurry across a third region at a third rate different from the second rate, wherein the second region is between the third region and the first region.
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公开(公告)号：US20230339068A1
公开(公告)日：2023-10-26
申请号：US18341421
申请日：2023-06-26
发明人： ChunHung CHEN , Jung-Yu LI , Sheng-Chen WANG , Shih-Sian HUANG
IPC分类号： B24B37/26 , B24B37/24 , B24B37/22 , B24B37/10 , B24B53/017 , B24B37/005 , B24B49/12
CPC分类号： B24B37/26 , B24B37/24 , B24B37/22 , B24B37/10 , B24B53/017 , B24B37/005 , B24B49/12
摘要： A method of using a polishing pad includes applying a slurry to a first location on the polishing pad. The method further includes rotating the polishing pad. The method further includes spreading the slurry across a first region of the polishing pad at a first rate, wherein the first region includes a plurality of first grooves. The method further includes spreading the slurry across a second region, surrounding the first region of the polishing pad at a second rate different from the first rate, wherein the second region includes a plurality of second grooves. The method further includes spreading the slurry across a third region, surrounding the second region of the polishing pad at a third rate less than the first rate and the second rate, wherein the third region includes a plurality of third grooves.
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