公开(公告)号：US20230052532A1

公开(公告)日：2023-02-16

申请号：US16768539

申请日：2020-05-20

Applicant: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

Inventor： Zhiwu WANG

IPC: C23C16/513 ,  C23C16/44 ,  C23C16/455

Abstract: The present application discloses a vapor deposition apparatus, including: a reaction chamber, a gas spraying device, and a cleaning gas channel, wherein the gas spraying device includes a reaction gas channel, and the reaction gas channel includes an outlet communicating with the reaction chamber; and the cleaning gas channel is spaced apart from the reaction gas channel, such that the probability of generating the residual produce in the reaction chamber can be reduced, and the uniformity of film formation and the utilization rate of the machine are improved.

公开(公告)号：US20220375988A1

公开(公告)日：2022-11-24

申请号：US16648637

申请日：2020-02-28

Applicant: TCL China Star Optoelectronics Technology Co., Ltd.

Inventor： Zhiwu WANG

IPC: H01L27/15 ,  H01L33/62 ,  H01L33/38 ,  H01L33/00

Abstract: The present application provides a micro light emitting diode (LED) display panel and a transfer printing method of a micro LED. The micro LED display panel includes micro LED strips arranged on a driving substrate. Each micro LED strip includes at least two micro LEDs. The micro LEDs are electrically connected to thin film transistors (TFTs) through bottom electrodes of the driving substrate. By having a light shielding layer on the driving substrate, the present application solves problems like light leakage and color mixing of the display panel.