公开(公告)号：US20190304688A1

公开(公告)日：2019-10-03

申请号：US16359824

申请日：2019-03-20

Applicant: TDK CORPORATION

Inventor： Saori TAKAHASHI ,  Masahito FURUKAWA ,  Masamitsu HAEMORI ,  Hiroki UCHIYAMA ,  Wakiko SATO ,  Hitoshi SAITA

IPC: H01G4/12 ,  H01G4/33

Abstract: A dielectric membrane may be exposed to an acid solution such as hydrochloric acid, nitric acid, or sulfuric acid during a wet process after membrane formation. The inventors have newly found that when a dielectric membrane includes Ca having a lower ionization tendency than Ba and Zr having a lower ionization tendency than Ti in a main component of a metal oxide expressed by a general formula (Ba, Ca)(Ti, Zr)O3 and satisfies at least one of degree of orientation of (100) plane>degree of orientation of (110) plane and degree of orientation of (111) plane>degree of orientation of (110) plane in a membrane thickness direction, the dielectric membrane is less likely to be damaged during a wet process, and the resistance to a wet process is improved.