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公开(公告)号:US20240290547A1
公开(公告)日:2024-08-29
申请号:US18588629
申请日:2024-02-27
Applicant: TDK Corporation
Inventor: Masahiro HIRAOKA , Hitoshi SAITA
IPC: H01G4/33 , H01G4/012 , H01G4/228 , H01L23/00 , H01L23/498
CPC classification number: H01G4/33 , H01G4/012 , H01G4/228 , H01L23/49822 , H01L24/48 , H01L28/55 , H01L28/60 , H01L2224/48465 , H01L2924/19041
Abstract: Disclosed herein is a thin film capacitor that includes a capacitor part having a lower electrode, an inner electrode, and a dielectric layer positioned between the lower electrode and the inner electrode, an insulating layer covering the capacitor part, a terminal electrode provided on the insulating layer, and a plurality of via holes penetrating the insulating layer so that the terminal electrode and the inner electrode of the capacitor part are connected to each other via the plurality of via holes. The terminal electrode includes a via region on which the plurality of via holes are arranged and having a ring-shaped, and a bonding region surrounded by the via region and having flat-shaped.
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公开(公告)号:US20240057258A1
公开(公告)日:2024-02-15
申请号:US18259163
申请日:2022-01-12
Applicant: TDK Corporation
Inventor: Hitoshi SAITA
CPC classification number: H05K1/181 , H05K1/0306 , H05K1/0204 , H05K2201/10015
Abstract: An object of the present disclosure is to provide a circuit board capable of achieving improved heat dissipation characteristics. The circuit board includes a substrate having a ceramic board as a base material; and a thin film capacitor mounted on the substrate such that a mounting surface faces the conductor layer. The thin film capacitor includes the dielectric layer, first and second capacitor electrodes, formed on one and the other surfaces of the dielectric layer. The capacitor electrode is connected to the wiring pattern included in the conductor layer. The capacitor electrode or a terminal electrode connected thereto is exposed to the upper surface of the thin film capacitor that faces away from the mounting surface.
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公开(公告)号:US20200266003A1
公开(公告)日:2020-08-20
申请号:US16790347
申请日:2020-02-13
Applicant: TDK Corporation
Inventor: Toshio ASAHI , Hitoshi SAITA
Abstract: Disclosed herein is a thin film capacitor embedded substrate that includes a substrate and a plurality of thin film capacitors including at least first and second thin film capacitors embedded in the substrate. The first and second thin film capacitors are connected in parallel and have mutually different self-resonant frequencies.
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公开(公告)号:US20160217931A1
公开(公告)日:2016-07-28
申请号:US15006366
申请日:2016-01-26
Applicant: TDK CORPORATION
Inventor: Hitoshi SAITA , Hiroyasu INOUE , Yoshihiko YANO
CPC classification number: H01G4/33 , H01G4/1227 , H01G4/1236
Abstract: A thin film capacitor comprises a base material, a dielectric layer provided on the base material, and an upper electrode layer provided on the dielectric layer. The dielectric layer includes a plurality of columnar crystals that extend along a normal direction with respect to a surface of the upper electrode layer, the columnar crystal has a perovskite crystal structure represented by AyBO3, an element A is at least one of Ba, Ca, Sr, and Pb, an element B is at least one of Ti, Zr, Sn, and Hf, y≦0.995 is satisfied, and the dielectric layer contains 0.05 to 2.5 mol of Al per 100 mol of AyBO3.
Abstract translation: 薄膜电容器包括基材,设置在基材上的电介质层和设置在电介质层上的上电极层。 电介质层包括相对于上电极层的表面沿法线方向延伸的多个柱状晶体,柱状晶体具有由AyBO 3表示的钙钛矿晶体结构,元素A为Ba,Ca, Sr和Pb,元素B为Ti,Zr,Sn和Hf中的至少一种,y≤0.995,并且每100摩尔AyBO 3的电介质层含有0.05〜2.5摩尔的Al。
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公开(公告)号:US20220172894A1
公开(公告)日:2022-06-02
申请号:US17536319
申请日:2021-11-29
Applicant: TDK Corporation
Inventor: Suguru ANDOH , Hiroshi TAKASAKI , Hitoshi SAITA
Abstract: Disclosed herein is a thin film capacitor that includes a capacitive insulating film having first and second surfaces opposite to each other, a first capacitive electrode covering the first surface of the capacitive insulating film, and a second capacitive electrode covering the second surface of the capacitive insulating film and including a plurality of capacitor areas divided by a slit and a plurality of fuse areas connecting two of adjacent capacitor areas. The second capacitive electrode has a structure in which a plurality of conductor films including a first conductor film and a second conductor film lower in electrical resistivity than the first conductor film are laminated.
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公开(公告)号:US20210292244A1
公开(公告)日:2021-09-23
申请号:US17189859
申请日:2021-03-02
Applicant: TDK CORPORATION
Inventor: Toshio ASAHI , Masamitsu HAEMORI , Hitoshi SAITA , Masahito FURUKAWA
Abstract: A dielectric thin film contains Ca, Sr, Ti, Hf, O and N, wherein among crystal grains existing in a plane field of view of 1 μm square perpendicular to a film thickness direction of the dielectric thin film, a number ratio of crystal grains having a grain size of 19 nm or more and less than 140 nm is 95% or more, among the crystal grains existing in the plane field of view, a number ratio of first crystal grains having a grain size of 65 nm or more and less than 77 nm is 20% or more, and among the crystal grains existing in the plane field of view, a number ratio of second crystal grains having a grain size of 19 nm or more and less than 54 nm is 40% or less.
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7.
公开(公告)号:US20210110974A1
公开(公告)日:2021-04-15
申请号:US17034507
申请日:2020-09-28
Applicant: TDK CORPORATION
Inventor: Masamitsu HAEMORI , Toshio ASAHI , Hitoshi SAITA
Abstract: The present invention provides a dielectric composition having high relative permittivity and insulation resistance at high temperature. The dielectric composition includes a main component expressed by a compositional formula (Sr1-x, Cax)m(Ti1-yHfy)O3-δNδ, in which 0
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8.
公开(公告)号:US20170290165A1
公开(公告)日:2017-10-05
申请号:US15467685
申请日:2017-03-23
Applicant: TDK CORPORATION
Inventor: Hitoshi SAITA
IPC: H05K1/18 , H01L23/00 , H05K3/32 , H01L21/48 , H05K3/00 , H05K3/46 , H05K3/30 , H01L23/498 , H05K1/11
CPC classification number: H01L21/486 , H01G4/33 , H01L21/4857 , H01L23/49822 , H01L23/49827 , H01L24/16 , H01L2224/16227 , H01L2224/16235 , H05K1/162 , H05K3/429 , H05K3/4644 , H05K2201/09536 , H05K2201/09672 , H05K2201/10015
Abstract: A thin film component sheet includes: a conducting interconnection layer formed of a conductor; an insulating layer that is laminated on the conducting interconnection layer and is formed of an insulating material; and a plurality of thin film electronic components, each of which has a pair of first and second electrode layers and a dielectric layer provided between the first and second electrode layers, and which are arranged to be separated on the insulating layer. In a state in which a main surface of the first electrode layer in each of the plurality of thin film electronic components is exposed to an outside on a main surface of one side of the thin film component sheet, a flat surface of the main surface of the thin film component sheet is formed,
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公开(公告)号:US20170025324A1
公开(公告)日:2017-01-26
申请号:US15217111
申请日:2016-07-22
Applicant: TDK CORPORATION
Inventor: Masahiro YAMAKI , Hitoshi SAITA
IPC: H01L23/367 , H01G4/12 , H01L23/498 , H01G2/14 , H01L23/00 , H01L23/42 , H01G4/33 , H01G4/005
CPC classification number: H01L23/42 , H01G2/14 , H01G4/005 , H01G4/012 , H01G4/1227 , H01G4/224 , H01G4/33 , H01L23/3677 , H01L23/49816 , H01L23/49822 , H01L23/49827 , H01L24/16 , H01L28/82 , H01L28/84 , H01L2224/16265 , H01L2924/19015 , H01L2924/19041 , H01L2924/19102
Abstract: The present invention provides a thin film capacitor including a first electrode layer, a second electrode layer, and a dielectric layer provided between the first electrode layer and the second electrode layer, wherein a ratio (S/S0) of a surface area S of a surface of the first electrode layer on an opposite side to the dielectric layer to a projected area S0 in a thickness direction of the first electrode layer is 1.01 to 5.00.
Abstract translation: 本发明提供了一种薄膜电容器,其包括设置在第一电极层和第二电极层之间的第一电极层,第二电极层和电介质层,其中,表面积S的比率(S / S0) 第一电极层的与电介质层相反的一侧的表面与第一电极层的厚度方向上的投影面积S0为1.01〜5.00。
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公开(公告)号:US20230094616A1
公开(公告)日:2023-03-30
申请号:US17954659
申请日:2022-09-28
Applicant: TDK CORPORATION
Inventor: Tadashi IINO , Hiroyasu INOUE , Hitoshi SAITA
Abstract: A thin film capacitor having a multilayer structure including a first electrode, a first dielectric layer, a second dielectric layer, and a second electrode in this order. The second dielectric layer and the second electrode are in contact. The first dielectric layer includes a perovskite type compound. The second dielectric layer includes a perovskite type compound or an oxide of M. When X1 and X2a represents an absolute value of an average energy for formation of an oxide of a cationic element included in a B site of the perovskite type compound included in the first dielectric layer and the second dielectric layer respectively, and X2b represents an absolute value of an average energy for formation of an oxide of M included in the second dielectric layer, then X2a
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