公开(公告)号：US11980848B2

公开(公告)日：2024-05-14

申请号：US18136938

申请日：2023-04-20

Applicant: TEKNOLOGIAN TUTKIMUSKESKUS VTT OY

Inventor： Kristian Melin ,  Pekka Simell ,  Esa Kurkela ,  Marjut Suomalainen

IPC: B01D53/75 ,  B01D53/14 ,  B01D53/18 ,  B01D53/62 ,  B01D53/78

CPC classification number: B01D53/75 ,  B01D53/1406 ,  B01D53/1475 ,  B01D53/1493 ,  B01D53/18 ,  B01D53/62 ,  B01D53/78 ,  B01D2251/304 ,  B01D2251/606 ,  B01D2252/103

Abstract: An apparatus for purifying gas where gas is treated in a multistage treatment having at least two ejector stages, a motive medium including liquid, steam or gaseous agent at high pressure injected by an ejector of the ejector stage, and the gas is sucked into the same ejector and mixed with the motive medium for forming a mixture, at least a part of gas and/or liquid phase of the mixture is supplied to a second ejector stage having so that a second motive medium which includes liquid, steam or gaseous agent is injected to the ejector and the gas and/or the liquid phase is sucked into the same ejector in which the gas and/or liquid phase is mixed with the second motive medium for forming a second mixture, at least one of the mixtures includes an additive for removing impurities of the gas, and a purified gas is formed.

公开(公告)号：US11660569B2

公开(公告)日：2023-05-30

申请号：US16610157

申请日：2018-05-09

Applicant: TEKNOLOGIAN TUTKIMUSKESKUS VTT OY

Inventor： Kristian Melin ,  Pekka Simell ,  Esa Kurkela ,  Marjut Suomalainen

IPC: B01D53/75 ,  B01D53/14 ,  B01D53/18 ,  B01D53/62 ,  B01D53/78

CPC classification number: B01D53/75 ,  B01D53/1406 ,  B01D53/1475 ,  B01D53/1493 ,  B01D53/18 ,  B01D53/62 ,  B01D53/78 ,  B01D2251/304 ,  B01D2251/606 ,  B01D2252/103

Abstract: A method and apparatus for purifying gas where gas is treated in a multistage treatment having at least two ejector stages, a motive medium including liquid, steam or gaseous agent at high pressure injected by an ejector of the ejector stage, and the gas is sucked into the same ejector and mixed with the motive medium for forming a mixture, at least a part of gas and/or liquid phase of the mixture is supplied to a second ejector stage having so that a second motive medium which includes liquid, steam or gaseous agent is injected to the ejector and the gas and/or the liquid phase is sucked into the same ejector in which the gas and/or liquid phase is mixed with the second motive medium for forming a second mixture, at least one of the mixtures includes an additive for removing impurities of the gas, and a purified gas is formed.