THREE-DIMENSIONAL TRANSISTOR DEVICE HAVING CONFORMAL LAYER

    公开(公告)号:US20230352580A1

    公开(公告)日:2023-11-02

    申请号:US17732211

    申请日:2022-04-28

    Abstract: A semiconductor device includes a semiconductor substrate including a corrugated surface. A body has a first conductivity type and includes a portion extending continuously along the corrugated surface. A gate dielectric layer is on the body and extends continuously along the corrugated surface. A gate is on the gate dielectric layer, the gate extending continuously along the corrugated surface. A corrugated conformal drift region has a second conductivity type opposite from the first conductivity type, and is on and conformal with the corrugated surface of the semiconductor substrate, and extends continuously along the corrugated surface. A source has the second conductivity type and includes a portion extending continuously along the corrugated surface, the source being in contact with the body. A drain contact region electrically coupled to the drift region and having the second conductivity type.

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