公开(公告)号：US11852192B2

公开(公告)日：2023-12-26

申请号：US17297161

申请日：2019-11-14

申请人： THK CO., LTD.

发明人： Tadashi Nakano ,  Takama Igarashi ,  Hajime Fukushima ,  Go Tamura

IPC分类号： F16C29/06

CPC分类号： F16C29/0604 ,  F16C29/0609 ,  F16C2240/50

摘要： A motion guide apparatus which can prevent the motion guide apparatus from rattling when being used in an environment Where an excessive moment works thereon. A crowning is formed at an end of a loaded rolling element rolling surface of a movable member, and a chamfer is formed at an end of the crowning. Let a total length of the crowning and the chamfer in a length direction of the loaded rolling element rolling surface be L. Let the diameter of a ball be Da. L/Da>4 is set. A maximum depth D of the chamfer is set to equal to or greater than the elastic deformation amount of a rolling element rolling surface of a track member, the loaded rolling element rolling surface of the movable member, and the rolling element under a radial load equal to or greater than 60% of the basic dynamic load rating.

公开(公告)号：US20220025927A1

公开(公告)日：2022-01-27

申请号：US17297161

申请日：2019-11-14

申请人： THK CO., LTD.

发明人： Tadashi Nakano ,  Takama Igarashi ,  Hajime Fukushima ,  Go Tamura

IPC分类号： F16C29/06

摘要： A motion guide apparatus which can prevent the motion guide apparatus from rattling when being used in an environment where an excessive moment works thereon. A crowning is formed at an end of a loaded rolling element rolling surface of a movable member, and a chamfer is formed at an end of the crowning. Let a total length of the crowning and the chamfer in a length direction of the loaded rolling element rolling surface be L. Let the diameter of a ball be Da. L/Da>4 is set. A maximum depth D of the chamfer is set to equal to or greater than the elastic deformation amount of a rolling element rolling surface of a track member, the loaded rolling element rolling surface of the movable member, and the rolling element under a radial load equal to or greater than 60% of the basic dynamic load rating.