Abstract:
A vacuum tube for producing a wide high-uniformity beam of fast accelerated electrons. The tube comprises an evacuated enclosure provided with an electron transparent window and containing an elongated cathode, accelerator electrodes and a control electrode formed by sleeves electrically insulated from one another and brought to separately adjustable potentials.
Abstract:
Linear particle accelerator of compact dimensions, intended for industrial or medical applications, comprising, in a vacuum enclosure, a particle source and an accelerating structure having an input coupler connected to a waveguide extending along the lateral and end walls of said accelerating structure, the waveguide portion located against the end wall of said structure being provided with two holes located along the beam path for the passage of accelerated particles; a hood arrangement groups all parts of the accelerating device (accelerator, UHF electromagnetic power source, voltage supplies).
Abstract:
The bunching device in accordance with the invention is essentially constituted by a cylindrical cavity resonator, which advantageously replaces the conventional device encountered in linear accelerators, including a velocity-modulation cavity for modulating the particles and a drift space for bunching said particles. The length of this bunching cavity is associated with the velocity of the particles in said cavity and with the operating frequency of the accelerator. A device of this kind, which is of small size and low cost, renders unnecessary the conventional control of amplitude and phase of the signals which are injected into the bunching device and the accelerator structure, which are coupled in a direct manner. Furthermore, it enables operation to be carried out under conditions of heavy current, whilst achieving good efficiency.
Abstract:
The invention relates to an arrangement for accelerating, to a predetermined velocity at least one bunch from a bunched beam of particles, the length of said bunch corresponding to one cycle of the high frequency of the accelerator. In this arrangement the injection voltage V of the beam is raised to a value larger than the cut-off voltage Vc of the accelerator, exclusively during a short period. Said injection voltage V is created by the addition of a pulsed voltage Vo and high-frequency voltages V1 and V2 generated in resonant cavities 3 and 4 disposed in the trajectory of the beam and tuned respectively to a sub-multiple of said high frequency.