公开(公告)号：US20220234000A1

公开(公告)日：2022-07-28

申请号：US17613877

申请日：2020-05-26

Applicant: TOKUYAMA CORPORATION

Inventor： Masao KUSUNOKI ,  Hiroki TANAKA ,  Yoshimi TAMAKI ,  Dai TSUNODA

IPC: B01D53/78 ,  B01D53/62 ,  B01D53/75 ,  B01D53/94

Abstract: The present invention provides a method including: a gas absorption step of bringing exhaust gas into contact with an aqueous solution containing alkaline carbonate, so that carbon dioxide gas in the exhaust gas is allowed to react therewith, thereby obtaining an aqueous solution containing alkaline bicarbonate; a gas recovery step of recovering a gas containing nitrogen gas and oxygen gas obtained as a result of the gas absorption step; a decomposition step of decomposing at least a part of the alkaline bicarbonate obtained in the gas absorption step into the alkaline carbonate and the carbon dioxide gas; a circulation step of circulating at least a part of the alkaline carbonate obtained in the decomposition step to the gas absorption step; and a carbon dioxide gas recovery step of bringing a gas containing the carbon dioxide gas obtained as a result of the decomposition step into contact with an aqueous solution, thereby recovering the carbon dioxide gas obtained in the decomposition step.

公开(公告)号：US20220411265A1

公开(公告)日：2022-12-29

申请号：US17780311

申请日：2020-12-03

Applicant: TOKUYAMA CORPORATION

Inventor： Akihiro SAITO ,  Dai TSUNODA ,  Masayuki MORIWAKI

IPC: C01B7/07 ,  B01D53/14 ,  B01D19/00 ,  B01D3/42

Abstract: A method for producing a high-purity hydrogen chloride gas comprises performing a purification process that includes the steps 1) to 3) below on a byproduct hydrogen chloride gas: 1) a crude hydrochloric acid generation step of allowing water to absorb the byproduct hydrogen chloride gas; 2) a volatile organic impurity-removed hydrochloric acid generation step of bringing the crude hydrochloric acid obtained in the step 1) into contact with an inert gas at a liquid temperature of 20 to 45° C. to dissipate volatile organic impurities; and 3) a high-purity hydrogen chloride gas generation step of supplying the volatile organic impurity-removed hydrochloric acid obtained in the step 2) to a distillation column and performing distillation under conditions of a column bottom temperature of higher than 60° C. and 108° C. or lower and a column top temperature of 60° C. or lower to distill out a high-purity hydrogen chloride gas.