公开(公告)号：US12054568B2

公开(公告)日：2024-08-06

申请号：US17413841

申请日：2019-12-17

申请人： TOKUYAMA CORPORATION

发明人： Ayako Ohara ,  Taichi Hanasaki ,  Junji Takenaka ,  Junji Momoda

IPC分类号： C08F2/46 ,  C08F2/50 ,  C08F20/14 ,  C08F222/10 ,  C08F290/14 ,  C08G61/04 ,  C08K5/3475 ,  C08L75/06 ,  G02B1/111 ,  G02B1/04

CPC分类号： C08F222/1063 ,  C08F2/50 ,  C08F20/14 ,  C08F290/142 ,  C08K5/3475 ,  C08L75/06 ,  G02B1/111 ,  C08F2800/20 ,  G02B1/041

摘要： The present invention is an optical material composition containing (A) 100 parts by mass of a polymerizable monomer, and (B) 0.001 to 0.3 parts by mass of a UV absorbent having a maximum absorption wavelength of 360 nm or more and less than 380 nm and having a specific structure, and an optical material formed of the composition. According to the present invention, there can be provided an optical material composition containing a UV absorbent and having good long-term storage stability, and an optical material formed of the composition, in particular, an optical material composition capable of forming a plastic lens having a high blue light cut rate.

公开(公告)号：US12024663B2

公开(公告)日：2024-07-02

申请号：US17419058

申请日：2020-02-13

申请人： TOKUYAMA CORPORATION

发明人： Yuki Kikkawa ,  Tomoaki Sato ,  Takafumi Shimoda ,  Takayuki Negishi

IPC分类号： C09K13/06 ,  H01L21/304

CPC分类号： C09K13/06 ,  H01L21/304

摘要： Provided is a treatment liquid for a semiconductor wafer or the like used in a process for forming a semiconductor. Namely a treatment liquid containing (A) a hypochlorite ion, and (B) an alkylammonium salt expressed by the following Formula (1), or the like is provided.




(In the Formula, “a” is an integer from 6 to 20; R1, R2, and R3 are independently, for example, an alkyl group with a carbon number from 1 to 20; and X− is, for example, a chloride ion.).

公开(公告)号：US11998955B2

公开(公告)日：2024-06-04

申请号：US17766651

申请日：2020-09-04

申请人： TOKUYAMA CORPORATION

发明人： Junya Sakai ,  Takuya Yokose

IPC分类号： B08B3/04 ,  B08B13/00 ,  C01B33/02 ,  C01B33/021 ,  C01B33/037

CPC分类号： B08B3/04 ,  B08B13/00 ,  C01B33/02 ,  C01B33/021 ,  C01B33/037

摘要： A device is provided which is capable of evenly etching the entire surface of a silicon core wire. An etching device (1) for a silicon core wire (C1, C2, C3) includes: an etching bath (11, 12) for holding an etching solution (L1, L2); and a plurality of core wire support members (31) for supporting the silicon core wire (C1, C2, C3), the plurality of core wire support members (31) each having a hole (31A) through which the silicon core wire (C1, C2, C3) is to pass; and a position change mechanism (40) for changing a relative position where the silicon core wire (C1, C2, C3) passes through in relation to the hole (31A).

公开(公告)号：US20240158647A1

公开(公告)日：2024-05-16

申请号：US18279710

申请日：2022-03-08

申请人： TOKUYAMA CORPORATION

发明人： Taichi HANASAKI ,  Masayuki MIYAZAKI ,  Toshimitsu HIRAREN ,  Katsuhiro MORI ,  Junji MOMODA

IPC分类号： C09D5/29 ,  C08F289/00 ,  C08K5/3435 ,  C09D5/00 ,  C09D7/20 ,  C09D7/47 ,  C09D7/63 ,  C09D151/08 ,  C09D175/04

CPC分类号： C09D5/29 ,  C08F289/00 ,  C08K5/3435 ,  C09D5/002 ,  C09D7/20 ,  C09D7/47 ,  C09D7/63 ,  C09D151/08 ,  C09D175/04 ,  G02C7/102

摘要： The present invention provides: a photochromic curable composition for providing a cured product having excellent durability and appearance; and a cured product (photochromic laminate) having a particularly favorable appearance. A photochromic curable composition according to an embodiment includes: (A1) a first hindered amine compound having at least one reactive group selected from the group consisting of a radically polymerizable group and a group reactive with a radically polymerizable group; (B) a radically polymerizable monomer comprising a polyrotaxane component (B1) having a radically polymerizable group while not having a piperidyl group; and (C) a photochromic compound.

公开(公告)号：US20240116849A1

公开(公告)日：2024-04-11

申请号：US17920921

申请日：2022-06-07

申请人： TOKUYAMA CORPORATION

发明人： Akihiro SAITO ,  Naoto MOCHIZUKI

IPC分类号： C07C209/68 ,  B01J19/02 ,  B01J19/24

CPC分类号： C07C209/68 ,  B01J19/02 ,  B01J19/243 ,  B01J2219/00033 ,  B01J2219/00166 ,  B01J2219/0295 ,  B01J2219/182

摘要： Provided are a manufacturing method and a manufacturing apparatus for efficiently manufacturing a halogen oxoacid solution with a high quality and excellent industrial properties. Specifically, a manufacturing method and a manufacturing apparatus of a halogen oxoacid are provided. The manufacturing method and the manufacturing apparatus include continuously supplying an organic alkaline solution and a halogen from a first end to a second end of a reaction tube so that liquid phase parts and/or gas phase parts are alternately and repeatedly provided in a transfer passage of the reaction tube, to perform gas-liquid mixing of the organic alkaline solution and the halogen at the liquid phase parts and/or gas phase parts.

公开(公告)号：US20240101751A1

公开(公告)日：2024-03-28

申请号：US18274188

申请日：2022-01-27

申请人： TOKUYAMA CORPORATION

发明人： Yasutomo SHIMIZU ,  Kazuishi FUKUDA ,  Takayoshi KAWASAKI

IPC分类号： C08G18/48 ,  B24B37/24 ,  C08G18/76 ,  C08L29/04

CPC分类号： C08G18/4883 ,  B24B37/24 ,  C08G18/7621 ,  C08L29/04

摘要： The hollow microballoon of the invention includes a resin produced by polymerizing a polymerizing composition that contains a cyclic molecule having at least three side chains with a polymerizable functional group introduced into the terminal thereof and a polymerizable monomer other than the cyclic molecule having at least three side chains with a polymerizable functional group introduced into the terminal thereof. According to the invention, there are provided hollow microballoon capable of imparting not only polishing characteristics but also excellent durability to a CMP polishing pad using the hollow microballoon.

公开(公告)号：US11932964B2

公开(公告)日：2024-03-19

申请号：US17601452

申请日：2020-04-02

申请人： Tokuyama Corporation

发明人： Takuya Asano ,  Kouichi Saiki ,  Miki Emoto ,  Tooru Onoda

IPC分类号： C30B29/06 ,  C30B15/04 ,  C30B30/00

CPC分类号： C30B29/06 ,  C30B15/04 ,  C30B30/00

摘要： A polycrystalline silicon material for producing silicon single crystal, containing a plurality of polycrystalline silicon chunks, in which assuming that a total concentration of donor elements present inside a bulk body of the polycrystalline silicon material is Cd1 [ppta], a total concentration of acceptor elements present inside the bulk body of the polycrystalline silicon material is Ca1 [ppta], a total concentration of the donor elements present on a surface of the polycrystalline silicon material is Cd2 [ppta], and a total concentration of the acceptor elements present on the surface of the polycrystalline silicon material is Ca2 [ppta], Cd1, Ca1, Cd2, and Ca2 satisfy a relation of 5 [ppta]≤(Ca1+Ca2)−(Cd1+Cd2)≤26 [ppta].

公开(公告)号：US11905499B2

公开(公告)日：2024-02-20

申请号：US17281712

申请日：2019-09-30

申请人： TOKUYAMA CORPORATION

发明人： Shunsuke Hosaka ,  Masanari Ishizuki

IPC分类号： C11D7/50 ,  C11D7/26 ,  C07C29/80 ,  C11D11/00

CPC分类号： C11D7/261 ,  C07C29/80 ,  C11D7/5022 ,  C11D11/0047

摘要： Provided is a high-purity isopropyl alcohol in which the concentration of a C7-12 acetal compound is 100 ppb or less on a mass basis, the concentration of the acetal compound in an accelerated test involving heating for 4 hours at 80° C. in a nitrogen atmosphere is increased by a factor of 30 or less with respect to the value thereof prior to heating, and the concentration of the acetal compound is maintained at a value of 100 ppb or less on a mass basis. Also provided is a method for manufacturing said high-purity isopropyl alcohol.

公开(公告)号：US11884596B2

公开(公告)日：2024-01-30

申请号：US17256114

申请日：2019-06-24

申请人： TOKUYAMA CORPORATION

发明人： Hironobu Fujimoto ,  Tsuyoshi Ikeda

IPC分类号： C04B35/626 ,  C04B35/581 ,  B01D1/18 ,  B01J2/04

CPC分类号： C04B35/62695 ,  C04B35/581 ,  C04B35/62625 ,  B01D1/18 ,  B01J2/04 ,  C04B2235/5436

摘要： The present invention aims to provide a method for producing granules for ceramic production, the method having high productivity and making it possible to obtain a ceramic which, when produced by press molding the granules and firing the resulting press molded product, has physical properties kept from lowering. The present invention is characterized by including: a slurry preparation step of preparing a slurry including a mixture containing a powder of an inorganic compound, a binder, and a solvent; a granulation step of introducing the slurry into a spray drying device to form a granulated substance containing the inorganic compound; an exhaust step of exhausting an atmospheric gas within the spray drying device via a cyclone having a surface made of ceramic; and a step of mixing a fine powder, which has been recovered by the cyclone during the exhaust step, with the granulated substance obtained in the granulation step.

公开(公告)号：US20230365739A1

公开(公告)日：2023-11-16

申请号：US18019153

申请日：2021-08-04

申请人： TOKUYAMA CORPORATION

发明人： Yasutomo SHIMIZU ,  Kazuishi FUKUDA ,  Takayoshi KAWASAKI

IPC分类号： C08G18/42 ,  C08G18/12 ,  B24B37/22 ,  B24B37/24 ,  C09K9/02 ,  C08G18/64 ,  C08K7/22 ,  C08G18/08 ,  C08G18/32

CPC分类号： C08G18/42 ,  C08G18/12 ,  B24B37/22 ,  B24B37/24 ,  C09K9/02 ,  C08G18/64 ,  C08K7/22 ,  C08G18/14 ,  C08G18/3243 ,  C08K2201/003 ,  C08G2101/00

摘要： The present invention relates to a curable composition containing (A) a side chain-containing cyclic molecule in which three or more side chains each having a polymerizable functional group introduced at a terminal are introduced ((A) cyclic polyfunctional monomer), and (B) a polymerizable monomer having a polymerizable functional group polymerizable with the side chain-containing cyclic molecule ((B) another polymerizable monomer). The present invention provides a curable composition from which a cured article having high abrasion resistance and enabling exhibition of excellent mechanical properties and photochromic properties is obtained. In particular, the present invention can provide a curable composition from which a cured article suitable for use as a polishing pad or a photochromic spectacle lens can be obtained.