TEST APPARATUS AND PLASMA PROCESSING APPARATUS
    1.
    发明申请
    TEST APPARATUS AND PLASMA PROCESSING APPARATUS 有权
    测试装置和等离子体处理装置

    公开(公告)号:US20140203821A1

    公开(公告)日:2014-07-24

    申请号:US14161538

    申请日:2014-01-22

    Abstract: Disclosed is a test apparatus for efficiently and accurately testing a high frequency voltage dependency of an impedance of a test object without damaging the test object. The test apparatus includes a high frequency power source unit, a reference waveform generator, a matching device, an oscilloscope, a control panel, and a main control unit. The test apparatus may boost a high frequency pulse output at a relatively low power from the high frequency power source unit to a voltage required for a high frequency withstand voltage test to be applied to a test object in a state where impedance matching is performed between the high frequency power source unit and the test by the matching device, that is, under a tuned state. Whether the waveform of the voltage applied to the test object is a defined waveform may be concisely monitored and observed by the oscilloscope.

    Abstract translation: 公开了一种用于有效且准确地测试测试对象的阻抗的高频电压依赖性而不损坏测试对象的测试装置。 测试装置包括高频电源单元,参考波形发生器,匹配装置,示波器,控制面板和主控制单元。 测试装置可以将来自高频电源单元的较低功率的高频脉冲输出升压到在被测对象施加的阻抗匹配的状态下进行的高频耐受电压测试所需的电压 高频电源单元和匹配装置的测试,即处于调谐状态。 施加到测试对象的电压的波形是否是定义的波形,可以由示波器进行简明的监视和观察。

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