公开(公告)号：US20210183685A1

公开(公告)日：2021-06-17

申请号：US17124139

申请日：2020-12-16

Applicant: TOKYO ELECTRON LIMITED

Inventor： Sungjae LEE ,  Toshiya TSUKAHARA ,  Mitsuaki SATO ,  Tetsuji SATO

IPC: H01L21/687 ,  H01L21/683 ,  H01L21/67 ,  H01J37/32

Abstract: Provided is an edge ring to reduce the frequency of replacement of an edge ring used for plasma processing and to suppress the leakage of a heat transfer gas. The edge ring has an annular first member and an annular second member, the first member has a recess on the lower surface and is made of a first material having plasma resistance, and the second member is arranged in the recess of the first member and is made of a second material having a rigidity lower than that of the first material.

公开(公告)号：US20210280450A1

公开(公告)日：2021-09-09

申请号：US17184792

申请日：2021-02-25

Applicant: Tokyo Electron Limited

Inventor： Mitsuaki SATO

IPC: H01L21/687 ,  H01J37/32

Abstract: A substrate processing apparatus that includes a chamber, a substrate support disposed in the chamber, and a connection is provided. The chamber is provided with a bottom including a first flow path, and the substrate support includes a second flow path. The connection connects the first flow path to the second flow path, and the connection includes a sleeve through which the first flow path is in fluid communication with the second flow path, and a core including a first rod segment and a first elastic foam segment. The core is disposed in the sleeve, and a gap is defined between an inner surface of the sleeve and a side surface of the first rod segment.