公开(公告)号：US20150329964A1

公开(公告)日：2015-11-19

申请号：US14707663

申请日：2015-05-08

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hideomi HANE ,  Takahito UMEHARA ,  Takehiro KASAMA ,  Tsubasa WATANABE

IPC: C23C16/455

CPC classification number: C23C16/45591 ,  C23C16/4405 ,  C23C16/4412 ,  C23C16/45519 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/45578

Abstract: There is provided a film forming apparatus including a raw material gas nozzle provided with gas discharge holes for discharging a mixed gas of a raw material gas and a carrier gas; a flow regulating plate portion extended along the longitudinal direction of the raw material gas nozzle; a central region configured to supply a separating gas from a center side within a vacuum container toward a substrate loading surface of a rotary table; a protuberance portion protruded from the flow regulating plate portion toward the rotary table at a position shifted toward a center side of the rotary table from the gas discharge holes; and a protuberance portion configured to restrain the separating gas from flowing between the flow regulating plate portion and the rotary table; and an exhaust port configured to vacuum exhaust the interior of the vacuum container.

Abstract translation: 提供一种成膜装置，包括：原料气体喷嘴，其设置有用于排出原料气体和载气的混合气体的气体排出孔; 沿着原料气体喷嘴的长度方向延伸的流量调节板部; 中央区域，被构造成将分离气体从真空容器内的中心侧朝向旋转台的基板装载面供给; 从气体排出孔朝向旋转台的中心侧移动的位置从流量调节板部向旋转台突出的突起部; 以及突起部，其构造成限制分离气体在流量调节板部分和旋转台之间流动; 以及排气口，其构造成真空排出真空容器的内部。