公开(公告)号：US12000699B2

公开(公告)日：2024-06-04

申请号：US17614880

申请日：2020-05-25

Applicant: TOPCON CORPORATION ,  RIKEN

Inventor： Homare Momiyama ,  Yoshiaki Sasaki ,  Isao Yoshimine ,  Chiko Otani ,  Tetsuya Yuasa

IPC: G01B9/02 ,  G01B9/02004 ,  G01B9/02091 ,  G01N21/01 ,  G01N21/45 ,  G01N21/47

CPC classification number: G01B9/02084 ,  G01B9/02004 ,  G01B9/02091 ,  G01N21/01 ,  G01N21/45 ,  G01N21/4795

Abstract: Provided is an optical interference measuring apparatus including a measuring unit for acquiring an interferogram of an interference wave obtained by irradiating a measuring target and a reference surface with electromagnetic waves and causing reflected waves from a reflecting surface of the measurement target and reflected waves from the reference surface to interfere and a signal processing unit for configuring an intensity profile in the depth direction by performing Fourier transform of the interferogram. The signal processing unit is configured to estimate a parameter for a model formula for an assumed surface count, based on the model formula of an interferogram when it is assumed that the measurement target has a predetermined structure, to select an optimal model by a statistical technique from the model formula to which a parameter estimated for the assumed surface count is applied, and to reconfigure an intensity profile based on the optimal model.