公开(公告)号：US20230258980A1

公开(公告)日：2023-08-17

申请号：US18125504

申请日：2023-03-23

Applicant: TOPPAN INC.

Inventor： Miki FUKUGAMI ,  Shigekazu YASUTAKE ,  Kaoru FURUTA

IPC: G02F1/1335

CPC classification number: G02F1/133614 ,  C23C14/081

Abstract: A gas barrier film according to an aspect of the present disclosure includes, in this order: a substrate; a first AlOx-deposited layer; a gas barrier intermediate layer; a second AlOx-deposited layer; and a gas barrier coating layer, each of the first and second AlOx-deposited layers having a thickness of 15 nm or less, each of the gas barrier intermediate layer and the gas barrier coating layer having a thickness of 200 to 400 nm, the gas barrier coating layer having a first complex modulus of 7 to 11 GPa at a measurement temperature of 25° C. and a second complex modulus of 5 to 8 GPa at a measurement temperature of 60° C., the first and second complex moduli being measured by nanoindentation.