Surface material pattern finish simulation device and surface material pattern finish simulation method

    公开(公告)号:US10475230B2

    公开(公告)日:2019-11-12

    申请号:US15847054

    申请日:2017-12-19

    Abstract: A device for generating a simulation image including circuitry which obtains information including normal vector map and light source information about a source of light to be applied to a surface of a material, calculates incident light information about incident light to each of pixels in an image to be generated as simulation of a finish of a pattern including a picture and an uneven shape on the surface, calculates a radiance of reflected light from the surface with respect to each of the pixels in the image, based on calculation information including the incident light information, the normal vector map, diffuse reflectance information about the picture, gloss information indicating gloss of the surface, and observation condition information about the material, and controls display of the image based on the radiance of each of the pixels.

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