公开(公告)号：US09272308B2

公开(公告)日：2016-03-01

申请号：US13838476

申请日：2013-03-15

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Kazuhiro Yashiki ,  Chikara Sawamura ,  Koji Umezaki ,  Akira Kubo

IPC: B29D11/00 ,  B05D5/06 ,  G02B5/18 ,  G02B5/32 ,  B42D25/29 ,  B42D25/324 ,  B42D25/328

CPC classification number: B05D5/063 ,  B42D25/29 ,  B42D25/324 ,  B42D25/328 ,  B42D2033/18 ,  B42D2033/24 ,  G02B5/1842 ,  G02B5/32 ,  Y10T428/24612

Abstract: A method of manufacturing an optical device that includes a relief structure formation layer, a first layer made of a first material having a refractive index different from that of a material of the relief structure formation layer, and a second layer made of a second material different from the first material and covering the first layer. A ratio of an amount of the second material at a position of the second region to an apparatus area of the second region is zero or smaller than a ratio of an amount of the second material at the position of the second sub-region to an apparatus area of the second sub region.

Abstract translation: 一种制造包括浮雕结构形成层的光学器件的方法，由折射率不同于所述浮雕结构形成层的材料的第一材料制成的第一层和由不同于所述浮雕结构形成层的第二材料制成的第二层 从第一个材料和第一层覆盖。 在第二区域的位置处的第二材料的量与第二区域的装置区域的比例为零或小于第二子区域的位置处的第二材料的量与装置的比率 第二子区域的区域。

公开(公告)号：US20130209676A1

公开(公告)日：2013-08-15

申请号：US13838476

申请日：2013-03-15

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Kazuhiro Yashiki ,  Chikara Sawamura ,  Koji Umezaki ,  Akira Kubo

IPC: B05D5/06

CPC classification number: B05D5/063 ,  B42D25/29 ,  B42D25/324 ,  B42D25/328 ,  B42D2033/18 ,  B42D2033/24 ,  G02B5/1842 ,  G02B5/32 ,  Y10T428/24612

Abstract: A method of manufacturing an optical device that includes a relief structure formation layer, a first layer made of a first material having a refractive index different from that of a material of the relief structure formation layer, and a second layer made of a second material different from the first material and covering the first layer. A ratio of an amount of the second material at a position of the second region to an apparatus area of the second region is zero or smaller than a ratio of an amount of the second material at the position of the second sub-region to an apparatus area of the second sub region.

Abstract translation: 一种制造包括浮雕结构形成层的光学器件的方法，由折射率不同于所述浮雕结构形成层的材料的第一材料制成的第一层和由不同于所述浮雕结构形成层的第二材料制成的第二层 从第一个材料和第一层覆盖。 在第二区域的位置处的第二材料的量与第二区域的装置区域的比例为零或小于第二子区域的位置处的第二材料的量与装置的比率 第二子区域的区域。