公开(公告)号：US20160327690A1

公开(公告)日：2016-11-10

申请号：US15109332

申请日：2015-07-16

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Osamu TOKINOYA ,  Tsukasa KITAHARA ,  Takeshi NISHIKAWA

IPC: G02B1/14 ,  F21V8/00 ,  B32B7/12

Abstract: A protective film for wavelength conversion sheet for protecting a fluorescent substance in a wavelength conversion sheet, the protective film for wavelength conversion sheet having a structure in which two or more barrier films, each comprising a substrate and one or more barrier layers provided on at least one surface of the substrate, are laminated.

Abstract translation: 一种用于保护波长转换片中的荧光物质的波长转换片的保护膜，所述波长转换片的保护膜具有两个或更多个阻挡膜，每个阻挡膜包括至少设置有基底和一个或多个阻挡层的阻挡膜 层叠基板的一个表面。

公开(公告)号：US20160327719A1

公开(公告)日：2016-11-10

申请号：US15109337

申请日：2015-07-16

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Tsukasa KITAHARA ,  Osamu TOKINOYA ,  Takeshi NISHIKAWA

IPC: F21V8/00 ,  B32B27/36 ,  B32B7/12 ,  B32B27/08

Abstract: A first quantum dot protective film comprises a first barrier film including a silica deposition layer, and a first diffusion layer. An O/Si ratio of the silica deposition layer is 1.7 or more and 2.0 or less on an atomic ratio basis, and a refractive index of the silica deposition layer is 1.5 or more and 1.7 or less; and a reflectance of the first quantum dot protective film is 10% or more and 20% or less and a transmittance the first quantum dot protective film is 80% or more and 95% or less, at all wavelengths of 450 nm, 540 am, and 620 nm.

Abstract translation: 第一量子点保护膜包括具有二氧化硅沉积层的第一阻挡膜和第一扩散层。 二氧化硅沉积层的O / Si比基于原子比为1.7以上且2.0以下，二氧化硅沉积层的折射率为1.5以上且1.7以下; 并且第一量子点保护膜的反射率为10％以上且20％以下，第一量子点保护膜的透射率在450nm，540μm的所有波长下为80％以上且95％以下， 和620nm。