ELECTROSTATIC CHUCK AND SEMICONDUCTOR MANUFACTURING APPARATUS

    公开(公告)号:US20220310433A1

    公开(公告)日:2022-09-29

    申请号:US17693623

    申请日:2022-03-14

    Applicant: TOTO LTD.

    Abstract: An electrostatic chuck includes a ceramic dielectric substrate and a base plate. The ceramic dielectric substrate includes a first major surface, a second major surface, a groove part, and a plurality of cooling gas holes. The groove part includes first and second circumferential grooves, and first and second radial-direction grooves. The plurality of cooling gas holes includes first and second holes. The first hole overlaps the first radial-direction groove. The second hole overlaps the second radial-direction groove. The base plate includes a gas inlet path that supplies the cooling gas to the first and second holes. The first circumferential groove includes first and second end portions. The second circumferential groove includes third and fourth end portions. The third end portion and the fourth end portion do not overlap the first end portion in the radial direction.

    ELECTROSTATIC CHUCK
    2.
    发明公开
    ELECTROSTATIC CHUCK 审中-公开

    公开(公告)号:US20230317493A1

    公开(公告)日:2023-10-05

    申请号:US18118879

    申请日:2023-03-08

    Applicant: TOTO LTD.

    CPC classification number: H01L21/6833 H05B3/283 H05B2203/005 H05B2203/016

    Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater unit. The heater unit includes a first power feeding portion, a second power feeding portion, and a heater line. The heater line includes a plurality of extension portions arranged in a second direction. The plurality of extension portions includes a first extension portion and a second extension portion. A third distance between the first extension portion and a first virtual tangent and a fourth distance between the second extension portion and a second virtual tangent each are not more than a first distance between the first power feeding portion and the second power feeding portion. The third distance and the fourth distance each are not more than a second distance between the plurality of extension portions.

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