MICROWAVE IRRADIATION APPARATUS AND METHOD OF PRODUCING METAL NANOPARTICLES

    公开(公告)号:US20240149345A1

    公开(公告)日:2024-05-09

    申请号:US18383737

    申请日:2023-10-25

    IPC分类号: B22F9/24 B01J19/12 B22F1/054

    摘要: There are provided a microwave irradiation apparatus and a production method of metal nanoparticles for producing the metal nanoparticles that allow efficiently preparing the metal nanoparticles having small and uniform particle sizes. The present disclosure relates to the microwave irradiation apparatus that includes two microwave irradiation sources, two waveguides, and one reaction portion. The two microwave irradiation sources are disposed such that respective microwave emission units thereof face one another. The two microwave irradiation sources, the two waveguides, and the one reaction portion are disposed such that respective microwaves emitted from the two microwave irradiation sources pass through the two waveguides and contact an entire surface of the one reaction portion. Furthermore, the reaction portion is adjusted to have a specific size.

    MICROWAVE IRRADIATION DEVICE AND METHOD OF PRODUCING METAL NANOPARTICLES

    公开(公告)号:US20240227010A1

    公开(公告)日:2024-07-11

    申请号:US18522385

    申请日:2023-11-29

    IPC分类号: B22F9/24 B01J19/12 B22F1/054

    摘要: Provided is a microwave irradiation device for producing metal nanoparticles and a method of producing metal nanoparticles that allow preparing metal nanoparticles with small and uniform particle sizes. The present disclosure relates to a microwave irradiation device and a method of producing metal nanoparticles using the device. The microwave irradiation device includes a reaction vessel for housing a reaction solution including a raw material of metal nanoparticles, a cooling mechanism that cools the reaction vessel from outside, and a microwave irradiation source for irradiating the reaction solution with a microwave. A solid substance having a dielectric constant lower than a dielectric constant of the reaction solution is disposed in the reaction vessel.