公开(公告)号：US20180053633A1

公开(公告)日：2018-02-22

申请号：US15802854

申请日：2017-11-03

Applicant: TRUMPF Huettinger Sp. z o. o.

Inventor： Wojciech Glazek ,  Rafal Bugyi

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32174 ,  H01J37/32926 ,  H01J37/32935 ,  H01J37/3299 ,  H03H7/38

Abstract: A plasma impedance matching unit for a plasma power supply system includes a first power connector for coupling the matching unit to a RF power source, a second power connector for coupling the matching unit to a plasma load, a data link interface for directly coupling the matching unit to another plasma impedance matching unit via a data link, and a controller configured to control the matching unit to match an impedance from the first power connector to an impedance at the second power connector, to operate as a master for at least one other impedance matching unit and/or at least one RF power source of the plasma power supply system, and to communicate via the data link interface with the at least one other impedance matching unit and/or the at least one RF power source of the plasma power supply system.

公开(公告)号：US10410835B2

公开(公告)日：2019-09-10

申请号：US15802854

申请日：2017-11-03

Applicant: TRUMPF Huettinger Sp. z o. o.

Inventor： Wojciech Glazek ,  Rafal Bugyi

IPC: H01J37/32 ,  H03H7/38

Abstract: A plasma impedance matching unit for a plasma power supply system includes a first power connector for coupling the matching unit to a RF power source, a second power connector for coupling the matching unit to a plasma load, a data link interface for directly coupling the matching unit to another plasma impedance matching unit via a data link, and a controller configured to control the matching unit to match an impedance from the first power connector to an impedance at the second power connector, to operate as a master for at least one other impedance matching unit and/or at least one RF power source of the plasma power supply system, and to communicate via the data link interface with the at least one other impedance matching unit and/or the at least one RF power source of the plasma power supply system.