公开(公告)号：US20100326599A1

公开(公告)日：2010-12-30

申请号：US12600655

申请日：2008-05-16

申请人： Tae-Kyong Hwang ,  Heaung-Shig Oh ,  Myung-Keun Noh

发明人： Tae-Kyong Hwang ,  Heaung-Shig Oh ,  Myung-Keun Noh

IPC分类号： H01L21/306

CPC分类号： H01L21/67063 ,  B01D2258/0216 ,  F04D19/046

摘要： Disclosed is an integrated vacuum producing apparatus, which vacuumizes a process chamber of an apparatus for manufacturing semiconductors, flat panel displays, etc. or exhausts gaseous material and by-products generated within the process chamber to an outside so as to purify it. Gaseous material, e.g. gas, generated within a chamber for manufacturing a semiconductor, a flat panel display, etc. is exhausted through each separate exhaust line so as to be purified. Therefore, excessive operation of a purifying system can be prevented through distribution of exhaust gas so that life span can be extended according to the operation of the apparatus. Also, exhausting can be smoothly achieved through each exhaust line so that it is possible to prevent delay of a semi-conductor manufacturing process due to inability of exhausting, and to easily remove non-reacted gas and by-products in an exhausting process.

摘要翻译： 公开了一种集成真空制造装置，其将用于制造半导体，平板显示器等的装置的处理室真空化，或将处理室内产生的气态材料和副产物排出到外部，以便净化它。 气体材料，例如。 在用于制造半导体的腔室内产生的气体，平板显示器等通过每个分离的排气管线排出，以便被净化。 因此，能够通过分配排气来防止净化系统的过度运转，从而可以根据设备的运行来延长使用寿命。 另外，能够通过各排气管线平滑地进行排气，从而可以防止由于排气不能引起的半导体制造工序的延迟，并且能够在排气过程中容易地除去未反应的气体和副产物。