公开(公告)号：US20030209050A1

公开(公告)日：2003-11-13

申请号：US10140734

申请日：2002-05-07

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Lu-Chang Chen ,  Yu-Chun Peng ,  Yi-Yao Tang

IPC: B23Q017/00 ,  G01W001/18

CPC classification number: H01L21/682 ,  H01J37/3171 ,  H01J2237/30433 ,  Y10T29/49027 ,  Y10T29/49036 ,  Y10T29/4978 ,  Y10T29/53022 ,  Y10T29/5313 ,  Y10T29/53165 ,  Y10T29/53265

Abstract: An apparatus and a method for calibrating the position of a wafer platform in an ion implanter, and particularly in a medium current ion implanter. The apparatus is constructed by a curvilinear piece formed in a half-circular shape, a pair of linear rods for supporting the curvilinear piece, and at least one cross-bracing rod connected in-between the pair of linear rods for providing rigidity of the apparatus. When the inside peripheral surface of the curvilinear piece intimately engages an outside peripheral surface of the wafer platform of the ion implanter, or when the first and second linear rods fit snugly on the implanter indicative that the wafer platform is properly calibrated at a zero-angle position. When such fitting is not possible, the wafer platform is then adjusted until a snug fitting is made possible.

Abstract translation: 用于校准离子注入机中的晶片平台的位置，特别是在中等电流离子注入机中的装置和方法。 该装置由形成为半圆形的曲线构件，用于支撑曲线构件的一对直线杆和连接在一对线性杆之间的至少一个交叉支撑杆构成，用于提供装置的刚性 。 当曲线件的内周面与离子注入机的晶片平台的外周表面紧密接合时，或者当第一和第二线性杆紧密地配合在注入器上时，指示晶片平台被正确地校准为零角度 位置。 当不可能进行这种装配时，则调整晶片平台直到使贴合件成为可能。