公开(公告)号：US10101651B1

公开(公告)日：2018-10-16

申请号：US15486305

申请日：2017-04-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： SHao-Chi Wei ,  Cheng-Ming Lin ,  Sheng-Chang Hsu ,  Yu-Hsin Hsu ,  Hao-Ming Chang

IPC: G03B27/58 ,  G03F1/64 ,  G03F1/22 ,  G03F1/60 ,  G03F7/20

Abstract: A photo mask assembly including a photo mask, a first adhesive layer adhered with the photo mask, a pellicle frame and a pellicle is provided. The pellicle frame includes a plurality of recesses for accommodating the first adhesive layer. The pellicle frame is adhered with the photo mask through the first adhesive layer accommodated in the plurality of recesses. The pellicle is disposed on the pellicle frame. The pellicle frame is between the pellicle and the first adhesive layer. An optical apparatus including the above-mentioned photo mask assembly is also provided.

公开(公告)号：US20180299768A1

公开(公告)日：2018-10-18

申请号：US15486305

申请日：2017-04-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Shao-Chi Wei ,  Cheng-Ming Lin ,  Sheng-Chang Hsu ,  Yu-Hsin Hsu ,  Hao-Ming Chang

IPC: G03F1/64 ,  G03F1/22 ,  G03F1/60 ,  G03F7/20

Abstract: A photo mask assembly including a photo mask, a first adhesive layer adhered with the photo mask, a pellicle frame and a pellicle is provided. The pellicle frame includes a plurality of recesses for accommodating the first adhesive layer. The pellicle frame is adhered with the photo mask through the first adhesive layer accommodated in the plurality of recesses. The pellicle is disposed on the pellicle frame. The pellicle frame is between the pellicle and the first adhesive layer. An optical apparatus including the above-mentioned photo mask assembly is also provided.