公开(公告)号：US09293331B2

公开(公告)日：2016-03-22

申请号：US14013604

申请日：2013-08-29

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yuan-Fu Yang ,  Ping-Fang Chen

IPC: H01L21/265 ,  H01J37/317 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01L21/265 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/2007 ,  H01J2237/20214 ,  H01J2237/24405

Abstract: In accordance with some embodiments, an assembly of an ion implanter system is provided. The assembly includes a control unit, a wafer holder and a detecting device. The wafer holder and the detecting device are respectively positioned at two sides of the control unit. The control unit is configured to drive the wafer holder and the detecting device to rotate about at least one rotation axis.

Abstract translation: 根据一些实施例，提供了离子注入机系统的组件。 组件包括控制单元，晶片保持器和检测装置。 晶片保持器和检测装置分别位于控制单元的两侧。 控制单元构造成驱动晶片保持器和检测装置围绕至少一个旋转轴线旋转。