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公开(公告)号：US20220299882A1
公开(公告)日：2022-09-22
申请号：US17477977
申请日：2021-09-17
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yuru Huang , Chueh-Chi Kuo , Tzung-Chi Fu , Chieh-Jen Cheng
IPC: G03F7/20
Abstract: An extreme ultraviolet (EUV) photolithography system includes a scanner. Photolithography system performs EUV photolithography processes with a reticle in the scanner. The scanner includes a reticle storage chamber, a reticle backside inspection chamber, and a reticle cleaning chamber. The reticle cleaning chamber cleans debris from the backside of the reticle within the scanner.
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