公开(公告)号：US20220299882A1

公开(公告)日：2022-09-22

申请号：US17477977

申请日：2021-09-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yuru Huang ,  Chueh-Chi Kuo ,  Tzung-Chi Fu ,  Chieh-Jen Cheng

IPC: G03F7/20

Abstract: An extreme ultraviolet (EUV) photolithography system includes a scanner. Photolithography system performs EUV photolithography processes with a reticle in the scanner. The scanner includes a reticle storage chamber, a reticle backside inspection chamber, and a reticle cleaning chamber. The reticle cleaning chamber cleans debris from the backside of the reticle within the scanner.

公开(公告)号：US11360392B2

公开(公告)日：2022-06-14

申请号：US16891067

申请日：2020-06-03

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Chang Hsu ,  Chieh-Jen Cheng ,  Li-Jui Chen ,  Shang-Chieh Chien ,  Chao-Chen Chang ,  Ssu-Yu Chen

IPC: G03F7/20 ,  H01L21/027

Abstract: An illuminator includes a first facet mirror receiving and reflecting an exposure radiation, an adjustable shielding element disposed on the first facet mirror, the adjustable shielding element adjusting intensity uniformity of the exposure radiation reflected by the first facet mirror, and a second facet mirror receiving and reflecting the exposure radiation reflected by the first facet mirror.

公开(公告)号：US20210033982A1

公开(公告)日：2021-02-04

申请号：US16891067

申请日：2020-06-03

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Chang Hsu ,  Chieh-Jen Cheng ,  Li-Jui Chen ,  Shang-Chieh Chien ,  Chao-Chen Chang ,  Ssu-Yu Chen

IPC: G03F7/20 ,  H01L21/027

Abstract: An illuminator includes a first facet mirror receiving and reflecting an exposure radiation, an adjustable shielding element disposed on the first facet mirror, the adjustable shielding element adjusting intensity uniformity of the exposure radiation reflected by the first facet mirror, and a second facet mirror receiving and reflecting the exposure radiation reflected by the first facet mirror.